SCHEMBL8527804

SCHEMBL8527804

Cc1cc2sc3ccccc3c(=O)c2cc1C

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.59
ALDH1A1 P00352 8/20 0.58
MAPT P10636 7/20 0.58
RAB9A P51151 4/20 0.58
L3MBTL1 Q9Y468 3/20 0.58
NPC1 O15118 3/20 0.58
TDP1 Q9NUW8 3/20 0.58
POLB P06746 3/20 0.58
MEN1 O00255 2/20 0.58
KMT2A Q03164 2/20 0.58
GAA P10253 1/20 0.58
HCRTR1 O43613 2/20 0.55
LMNA P02545 1/20 0.55
GPR3 P46089 1/20 0.46
MAOB P27338 2/20 0.46
MAOA P21397 1/20 0.46
HPGD P15428 4/20 0.43
SMN1; SMN2 Q16637 2/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30612336 1.00 KDM4E (0.59) KDM4EALDH1A1MAPTRAB9AL3MBTL1
SCHEMBL30162025 0.86 ALDH1A1 (0.64) KDM4EALDH1A1MAPTRAB9AL3MBTL1
SCHEMBL13135140 0.86 KDM4E (0.53) KDM4EALDH1A1MAPTRAB9AL3MBTL1
SCHEMBL5019890 0.86 KDM4E (0.69) KDM4EALDH1A1MAPTRAB9AL3MBTL1
SCHEMBL21666727 0.84 KDM4E (0.67) KDM4EALDH1A1MAPTRAB9AL3MBTL1
SCHEMBL12925865 0.84 GPR3 (0.61) KDM4EALDH1A1MAPTRAB9AL3MBTL1
SCHEMBL1042361 0.84 MAPT (0.61) KDM4EALDH1A1MAPTRAB9AL3MBTL1
SCHEMBL13135141 0.83 MAPT (0.54) KDM4EALDH1A1MAPTRAB9AL3MBTL1
SCHEMBL28268803 0.82 KDM4E (0.68) KDM4EALDH1A1MAPTRAB9AL3MBTL1
SCHEMBL9160474 0.82 GPR3 (0.68) KDM4EALDH1A1MAPTRAB9AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3728490-B1 SOLDER MASK INKJET INKS FOR MANUFACTURING PRINTED CIRCUIT BOARDS AGFA GEVAERT NV (BE) 2022-02-09 EP disclosed
US-10835644-B2 Surface-modified metal and method for modifying metal surface SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2020-11-17 US disclosed
EP-3406661-B1 SURFACE MODIFICATION METHOD FOR THREE-DIMENSIONAL OBJECT AND SYRINGE GASKET SUMITOMO RUBBER IND (JP) 2020-02-05 EP disclosed
CN-105246954-B Surface modification method of three-dimensional object and injector gasket 住友橡胶工业株式会社 2019-07-12 CN disclosed
CN-103849002-B Surface modified elastic body 住友橡胶工业株式会社 2019-06-18 CN disclosed
EP-3406661-A1 SURFACE MODIFICATION METHOD FOR THREE-DIMENSIONAL OBJECT AND SYRINGE GASKET Sumitomo Rubber Industries, Ltd. (JP) 2018-11-28 EP disclosed
EP-2998343-B1 SURFACE MODIFICATION METHOD FOR THREE-DIMENSIONAL OBJECT AND SYRINGE GASKET SUMITOMO RUBBER IND (JP) 2018-10-24 EP disclosed
EP-3070117-B1 SURFACE MODIFICATION METHOD AND SURFACE-MODIFIED ELASTIC OBJECT SUMITOMO RUBBER IND (JP) 2018-08-08 EP disclosed
US-9752003-B2 Surface-modified elastic body SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2017-09-05 US disclosed
US-9738744-B2 Surface modification method for three-dimensional object and syringe gasket SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2017-08-22 US disclosed
CN-104031281-A Surface modification method of stereo objects and sealing gasket for injector SUMITOMO RUBBER IND 2014-09-10 CN disclosed
EP-2743294-A1 Surface-modified elastic body Sumitomo Rubber Industries, Ltd. (JP) 2014-06-18 EP disclosed
CN-103849002-A Surface-modified elastic body SUMITOMO RUBBER IND 2014-06-11 CN disclosed
US-20140155510-A1 SURFACE-MODIFIED ELASTIC BODY SUMITOMO RUBBER INDUSTIRES, LTD. (JP) 2014-06-05 US disclosed
EP-0410654-B1 Light- sensitive composition FUJI PHOTO FILM CO LTD (JP) 1998-10-28 EP disclosed
EP-0368327-B1 Light-sensitive composition FUJI PHOTO FILM CO LTD (JP) 1995-02-15 EP disclosed
US-5202221-A Photocrosslinkable copolymer having maleimido side chain, cyanine dye sensitizer FUJI PHOTO FILM CO., LTD. (JP) 1993-04-13 US disclosed
US-5064747-A Improved photosensitivity using an unsaturated 1,3-dithiol-2-ylidene derivative; lithographic printing plates; photoresists FUJI PHOTO FILM CO., LTD. (JP) 1991-11-12 US disclosed
EP-0410654-A2 Light- sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1991-01-30 EP disclosed
EP-0368327-A2 Light-sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1990-05-16 EP disclosed