SCHEMBL2839780

SCHEMBL2839780

CC1(C)C(=O)CCN([O])C1(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4743786 0.76 BRD4 (0.31)
SCHEMBL15659511 0.67 CRBN (0.33)
SCHEMBL3306349 0.60
SCHEMBL11231060 0.59
SCHEMBL1631582 0.58 PGR (0.30)
SCHEMBL11728651 0.57 BRD4 (0.36)
SCHEMBL13520927 0.56 RAB9A (0.30)
SCHEMBL12494003 0.55 PTPN1 (0.36)
SCHEMBL15657132 0.55
SCHEMBL25419169 0.55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1718590-A4 CATALYST SYSTEM FOR AEOROBIC OXIDATION OF PRIMARY AND SECONDARY ALCOHOLS. NUTRASWEET CO (US) 2008-02-27 EP claimed
US-20070078284-A1 Catalyst system for aerobic oxidation of primary and secondary alcohols THE NUTRASWEET COMPANY 2007-04-05 US claimed
EP-1718590-A1 CATALYST SYSTEM FOR AEOROBIC OXIDATION OF PRIMARY AND SECONDARY ALCOHOLS. The NutraSweet Company (US) 2006-11-08 EP claimed
WO-2005082825-A1 CATALYST SYSTEM FOR AEOROBIC OXIDATION OF PRIMARY AND SECONDARY ALCOHOLS. THE NUTRASWEET COMPANY (US) 2005-09-09 WO claimed
EP-1140772-A1 COMPOSITION AND METHOD FOR INHIBITING RADICAL POLYMERISATION OF ETHYLENICALLY UNSATURATED ALIPHATIC MONOMERS RHODIA CHIMIE (FR) 2001-10-10 EP claimed
WO-2000037412-A1 COMPOSITION AND METHOD FOR INHIBITING RADICAL POLYMERISATION OF ETHYLENICALLY UNSATURATED ALIPHATIC MONOMERS RHODIA CHIMIE (FR) 2000-06-29 WO claimed
US-20100151389-A1 Alkaline developable photosensitive materials ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2010-06-17 US disclosed
EP-2166409-A2 Alkaline developable super-hydrophobic photosensitive materials Rohm and Haas Electronic Materials Korea Ltd. (KR) 2010-03-24 EP disclosed
US-6509494-B1 Distillation mixture of dicyclopentenyl esters ROHM AND HAAS COMPANY 2003-01-21 US disclosed
EP-1140772-A1 COMPOSITION AND METHOD FOR INHIBITING RADICAL POLYMERISATION OF ETHYLENICALLY UNSATURATED ALIPHATIC MONOMERS RHODIA CHIMIE (FR) 2001-10-10 EP disclosed
WO-2000037412-A1 COMPOSITION AND METHOD FOR INHIBITING RADICAL POLYMERISATION OF ETHYLENICALLY UNSATURATED ALIPHATIC MONOMERS RHODIA CHIMIE (FR) 2000-06-29 WO disclosed
EP-0294237-A2 Novel peroxide monomer and a polymer therefrom Nippon Paint Co., Ltd. (JP) 1988-12-07 EP disclosed