Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.42 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.42 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.42 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | BLM | P54132 | 1/20 | 0.37 |
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2574923 | 0.98 | L3MBTL1 (0.44) | L3MBTL1HRH3KMT2ACHRM2CHRM4 | |
| SCHEMBL30762 | 0.92 | — | — | |
| Ammonia Solution, Strong SCHEMBL28118769 | 0.90 | PIK3CD (0.47) | KMT2ACHRM2CHRM4CHRM5CHRM1 | |
| Hydrochloric Acid SCHEMBL7162864 | 0.90 | PIK3CD (0.47) | KMT2ACHRM2CHRM4CHRM5CHRM1 | |
| Methane SCHEMBL27440503 | 0.90 | PIK3CD (0.47) | KMT2ACHRM2CHRM4CHRM5CHRM1 | |
| Ammonia Solution, Strong SCHEMBL11155607 | 0.88 | PIK3CD (0.46) | KMT2ACHRM2CHRM4CHRM5CHRM1 | |
| Caprolactam SCHEMBL27738566 | 0.87 | FKBP5 (0.48) | L3MBTL1HRH3KMT2ACHRM2CHRM4 | |
| SCHEMBL15846768 | 0.83 | PIK3CD (0.46) | KMT2ACHRM2CHRM4CHRM5CHRM1 | |
| SCHEMBL29212561 | 0.83 | PIK3CD (0.42) | KMT2ACHRM2CHRM4CHRM5CHRM1 | |
| SCHEMBL9081577 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 456 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250244664-A1 | PHOTORESIST COMPOSITIONS AND PATTERNING METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2025-07-31 | — | — | US | claimed |
| US-20250102910-A1 | PHOTORESIST COMPOSITION AND METALLIZATION METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2025-03-27 | — | — | US | claimed |
| CN-119322427-A | Photoresist composition and metallization method | 杜邦电子材料国际有限责任公司 | 2025-01-17 | — | — | CN | claimed |
| US-20240231227-A1 | OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2024-07-11 | — | — | US | claimed |
| CN-117440944-A | Oxothiazonium ion-containing sulfonic acid derivative compounds as photoacid generators in resist applications | 贺利氏电子化学品有限公司 | 2024-01-23 | — | — | CN | claimed |
| WO-2022272226-A1 | OXATHIANIUM ION-CONTAINING SULFONIC ACID DERIVATIVE COMPOUND AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC (US) | 2022-12-29 | — | — | WO | claimed |
| CN-108267933-B | Radiation-sensitive composition and patterning and metallization process | 罗门哈斯电子材料有限责任公司 | 2021-12-03 | — | — | CN | claimed |
| US-10962880-B2 | Radiation-sensitive compositions and patterning and metallization processes | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2021-03-30 | — | — | US | claimed |
| US-20200201175-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION PROCESSES | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2020-06-25 | — | — | US | claimed |
| US-20180188648-A1 | RADIATION-SENSITIVE COMPOSITIONS AND PATTERNING AND METALLIZATION PROCESSES | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-07-05 | — | — | US | claimed |
| US-20030153660-A1 | POLYARYLENE SULFIDE RESIN COMPOSITION | KUREHA CORPORATION (JP) | 2003-08-14 | — | — | US | claimed |
| US-20020177067-A1 | Fluoro-containing photosensitive polymer and photoresist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. | 2002-11-28 | — | — | US | claimed |
| US-20010024763-A1 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-27 | — | — | US | claimed |
| US-6172236-B1 | FUNGICIDES | BAYER AKTIENGESELLSCHAFT (DE) | 2001-01-09 | — | — | US | claimed |
| EP-1021419-A1 | PROCESS FOR PREPARING TRIAZOLINE THIONE DERIVATIVES | BAYER AG (DE) | 2000-07-26 | — | — | EP | claimed |
| WO-1999019307-A1 | PROCESS FOR PREPARING TRIAZOLINE THIONE DERIVATIVES | BAYER AKTIENGESELLSCHAFT (DE) | 1999-04-22 | — | — | WO | claimed |
| WO-1996033706-A1 | COMPOSITIONS AND METHODS FOR INDUCING DERMAL ANALGESIA | PHARMETRIX, INC. (US) | 1996-10-31 | — | — | WO | claimed |
| EP-0271983-B1 | TRANSDERMAL FLUX ENHANCING COMPOSITIONS | PFIZER INC. (US) | 1991-06-12 | — | — | EP | claimed |
| US-4170561-A | Lubricating compositions with lactam or thiolactam-containing copolymers | ENTREPRISE DE RECHERCHES ET D'ACTIVITIES PETROLIERES (E.R.A.P.) (FR) | 1979-10-09 | — | — | US | claimed |
| US-3939129-A | Process for the preparation of random copolymers of mono-olefins or of mono-olefins and unconjugated dienes with lactams with substitution on the nitrogen atom by an unsaturated radical | SOCIETE NATIONALE DES PETROLES D'AQUITAINE (FR) | 1976-02-17 | — | — | US | claimed |