SCHEMBL28405673

SCHEMBL28405673

CCC(COC(CC)[Si](OC)(OC)OC)C1CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9104668 0.87
SCHEMBL28966009 0.74 ALDH1A1 (0.36)
SCHEMBL1904684 0.74 ALDH1A1 (0.37)
SCHEMBL23673323 0.74 ALDH1A1 (0.37)
SCHEMBL28764 0.74 ALDH1A1 (0.37)
SCHEMBL28444841 0.73 ALDH1A1 (0.35)
SCHEMBL9101547 0.73
SCHEMBL2297080 0.72 ALDH1A1 (0.36)
Methyl Alcohol SCHEMBL28322456 0.71 ALDH1A1 (0.35)
SCHEMBL9561821 0.70 ALDH1A1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105717747-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2021-12-21 CN disclosed
CN-105717743-B Photosensitive resin composition and application thereof 奇美实业股份有限公司 2021-12-21 CN disclosed
CN-105319852-B Photosensitive resin composition, protective film and element with protective film 奇美实业股份有限公司 2020-06-26 CN disclosed
CN-106909028-B Photosensitive resin composition, protective film and liquid crystal display element 奇美实业股份有限公司 2020-06-05 CN disclosed
CN-104950580-B Photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2020-01-03 CN disclosed