SCHEMBL28405676

SCHEMBL28405676

CC1(C)C2CCC1(CS(=O)(=O)N1C(=O)c3ccccc3C1=O)C(=O)C2

nearest known ligand 0.60

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.60
MEN1 O00255 3/20 0.60
SMN1; SMN2 Q16637 3/20 0.59
ALDH1A1 P00352 1/20 0.59
TSHR P16473 1/20 0.59
HSD17B10 Q99714 1/20 0.59
CYP1A2 P05177 1/20 0.59
CYP2C19 P33261 1/20 0.59
CXCR3 P49682 1/20 0.57
KDM4E B2RXH2 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27588002 0.91 KMT2A (0.53) KMT2AMEN1SMN1; SMN2ALDH1A1TSHR
SCHEMBL452144 0.82 KMT2A (0.56) KMT2AMEN1SMN1; SMN2ALDH1A1TSHR
SCHEMBL8071532 0.81 KMT2A (0.63) KMT2AMEN1SMN1; SMN2ALDH1A1TSHR
SCHEMBL29040265 0.78 SMN1; SMN2 (0.82) KMT2AMEN1SMN1; SMN2CXCR3KDM4E
SCHEMBL11623286 0.78 SMN1; SMN2 (0.82) KMT2AMEN1SMN1; SMN2CXCR3KDM4E
Phthalimide SCHEMBL12814192 0.77 CYP1A2 (0.60) KMT2AMEN1SMN1; SMN2ALDH1A1TSHR
SCHEMBL13969980 0.77 KMT2A (0.69) KMT2AMEN1SMN1; SMN2CXCR3KDM4E
SCHEMBL15316338 0.76 CYP1A2 (0.57) KMT2AMEN1SMN1; SMN2ALDH1A1TSHR
SCHEMBL306514 0.76 SMN1; SMN2 (0.67) KMT2AMEN1SMN1; SMN2ALDH1A1TSHR
SCHEMBL7756182 0.76 SMN1; SMN2 (0.79) KMT2AMEN1SMN1; SMN2ALDH1A1CXCR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 CN disclosed
CN-106909028-B Photosensitive resin composition, protective film and liquid crystal display element 奇美实业股份有限公司 2020-06-05 CN disclosed
CN-104950580-B Photosensitive polysiloxane composition and application thereof 奇美实业股份有限公司 2020-01-03 CN disclosed