SCHEMBL28429503

SCHEMBL28429503

CO[Ti](OC)(OC)C1CCCC2=C1C(C)c1ccccc12

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31039636 0.87 GPR3 (0.31)
SCHEMBL6250424 0.87 GPR3 (0.31)
SCHEMBL6253720 0.77 ADRA2C (0.30)
SCHEMBL31039634 0.77 ADRA2C (0.30)
SCHEMBL6252946 0.76 PARP1 (0.32)
Hydrochloric Acid SCHEMBL6250421 0.74 GPR3 (0.30)
Hydrochloric Acid SCHEMBL31039632 0.74 GPR3 (0.30)
SCHEMBL30150731 0.72
SCHEMBL8419247 0.71 HTR2A (0.33)
SCHEMBL28430120 0.70 CHRM2 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111433231-B Method for producing styrene resin and styrene resin molded body 出光兴产株式会社 2024-07-16 CN disclosed
CN-111433231-A Method for producing styrene resin and styrene resin molded body 出光兴产株式会社 2020-07-17 CN disclosed
CN-111417658-A Styrene resin, styrene resin composition, molded article thereof, and method for producing styrene resin 出光兴产株式会社 2020-07-14 CN disclosed