⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9345698 | 0.83 | — | — | |
| SCHEMBL13391048 | 0.77 | TSHR (0.32) | — | |
| SCHEMBL12533343 | 0.77 | — | — | |
| SCHEMBL20686030 | 0.76 | ALDH1A1 (0.33) | — | |
| SCHEMBL13190991 | 0.74 | TSHR (0.30) | — | |
| SCHEMBL25786845 | 0.74 | — | — | |
| SCHEMBL17048682 | 0.73 | — | — | |
| SCHEMBL7952551 | 0.73 | LMNA (0.30) | — | |
| SCHEMBL4947063 | 0.73 | LMNA (0.34) | — | |
| SCHEMBL2419775 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8349549-B2 | Resist surface modifying liquid, and method for formation of resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-08 | — | — | US | disclosed |
| US-20100129758-A1 | Resist surface modifying liquid, and method for formation of resist pattern using the same | TOKYO OHKA KOGYO CO., LTD. | 2010-05-27 | — | — | US | disclosed |