SCHEMBL28433372

SCHEMBL28433372

CCOC(C)CCOCCC(C)OCC

nearest known ligand 0.43

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.43
THRB P10828 1/20 0.38
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13081849 0.93 TDP1 (0.42) LMNATHRBTDP1
SCHEMBL6492390 0.92 LMNA (0.41) LMNATHRBTDP1
SCHEMBL15956187 0.89 LMNA (0.35) LMNATHRB
SCHEMBL26743666 0.89 LMNA (0.35) LMNATHRB
SCHEMBL25779343 0.89 ALDH1A1 (0.48) LMNATHRBTDP1
SCHEMBL25779378 0.87 LMNA (0.33) LMNA
SCHEMBL25779374 0.87 LMNA (0.33) LMNA
SCHEMBL24436126 0.85 LMNA (0.36) LMNATHRB
SCHEMBL25779354 0.83 MEN1 (0.39) LMNATHRB
SCHEMBL25779349 0.83 LMNA (0.31) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025089307-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2025-05-01 WO disclosed
WO-2025079519-A1 LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2025-04-17 WO disclosed
WO-2025079518-A1 LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2025-04-17 WO disclosed
WO-2025079517-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2025-04-17 WO disclosed
CN-112654928-A Positive photosensitive material 默克专利股份有限公司 2021-04-13 CN disclosed
CN-111123643-A Protective composition and method for forming photoresist pattern 台湾积体电路制造股份有限公司 2020-05-08 CN disclosed