SCHEMBL28433993

SCHEMBL28433993

FC(F)(F)C(F)(F)C(F)(F)C(F)(F)[Si](F)(F)Cl

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22529161 0.97 LMNA (0.36) LMNA
SCHEMBL1876006 0.97 LMNA (0.36) LMNA
SCHEMBL28771154 0.97 LMNA (0.36) LMNA
SCHEMBL16053763 0.79 LMNA (0.36) LMNA
SCHEMBL6855292 0.78 LMNA (0.33) LMNA
SCHEMBL30049059 0.77 LMNA (0.35) LMNA
SCHEMBL366936 0.75 LMNA (0.38) LMNA
SCHEMBL13231934 0.75 LMNA (0.38) LMNA
SCHEMBL26094 0.75 LMNA (0.38) LMNA
SCHEMBL6672544 0.75 LMNA (0.38) LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111433886-A Backside friction reduction of substrates 东京毅力科创株式会社 2020-07-17 CN claimed
CN-111433886-B Backside friction reduction of a substrate 东京毅力科创株式会社 2024-07-30 CN disclosed
CN-111965156-A High-gain surface Raman scattering device and manufacturing method thereof 万德辉 2020-11-20 CN disclosed
CN-111433886-A Backside friction reduction of substrates 东京毅力科创株式会社 2020-07-17 CN disclosed