⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29373 | 0.96 | — | — | |
| SCHEMBL1618313 | 0.96 | ALDH1A1 (1.00) | — | |
| SCHEMBL6756839 | 0.92 | — | — | |
| SCHEMBL10458538 | 0.92 | ALDH1A1 (0.92) | — | |
| SCHEMBL28402001 | 0.92 | — | — | |
| Ethane SCHEMBL7940564 | 0.92 | — | — | |
| Ammonia Solution, Strong SCHEMBL1782484 | 0.92 | — | — | |
| SCHEMBL9323495 | 0.92 | — | — | |
| SCHEMBL11327880 | 0.92 | — | — | |
| SCHEMBL8940464 | 0.92 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 191 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230288799-A1 | METHOD OF FORMING PATTERNS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2023-09-14 | — | — | US | claimed |
| US-6291385-B1 | Catalyst for polymerization or copolymerization of olefin | SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) | 2001-09-18 | — | — | US | claimed |
| US-20240201591-A1 | PHOTORESIST UNDERLAYER COMPOSITION | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2024-06-20 | — | — | US | disclosed |
| US-11940731-B2 | Photoresist topcoat compositions and methods of processing photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2024-03-26 | — | — | US | disclosed |
| US-11932713-B2 | Monomers, polymers and lithographic compositions comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2024-03-19 | — | — | US | disclosed |
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-20230418161-A1 | COATING COMPOSITIONS FOR USE WITH AN OVERCOATED PHOTORESIST | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-12-28 | — | — | US | disclosed |
| US-11846885-B2 | Topcoat compositions and photolithographic methods | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2023-12-19 | — | — | US | disclosed |
| US-11829069-B2 | Photoresist compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-28 | — | — | US | disclosed |
| CN-117089418-A | Substrate treatment composition and substrate treatment method using same | SK株式会社 | 2023-11-21 | — | — | CN | disclosed |
| US-11822248-B2 | Coating compositions for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2023-11-21 | — | — | US | disclosed |
| EP-2275490-A1 | Coating compositions for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2011-01-19 | — | — | EP | disclosed |
| EP-2258691-A1 | Coating compositions for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2010-12-08 | — | — | EP | disclosed |
| EP-2102184-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-09-23 | — | — | EP | disclosed |
| EP-2102156-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-09-23 | — | — | EP | disclosed |
| US-7582585-B2 | Underlying antireflective coating employed with overcoated photoresist layer in manufacture microelectronic wafers; relief images | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-09-01 | — | — | US | disclosed |
| WO-2008068617-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-06-12 | — | — | WO | disclosed |
| WO-2008068610-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-06-12 | — | — | WO | disclosed |
| US-20050181299-A1 | Coating compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2005-08-18 | — | — | US | disclosed |
| WO-2005066240-A1 | COATING COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2005-07-21 | — | — | WO | disclosed |