Ethane

Ethane

SCHEMBL7940564

CC.CC(C)(O)C(=O)O

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29373 0.96 — —
SCHEMBL1618313 0.96 ALDH1A1 (1.00) —
Ammonia Solution, Strong SCHEMBL1782484 0.92 — —
SCHEMBL10458538 0.92 ALDH1A1 (0.92) —
SCHEMBL28402001 0.92 — —
SCHEMBL9323495 0.92 — —
SCHEMBL8940464 0.92 — —
SCHEMBL6756839 0.92 — —
SCHEMBL11327880 0.92 — —
Methane SCHEMBL284453 0.92 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6291385-B1 Catalyst for polymerization or copolymerization of olefin SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) 2001-09-18 — — US claimed
JP-1056772-A — — None — — JP disclosed
US-20230375937-A1 SUBSTRATE PROCESSING COMPOSITION AND SUBSTRATE PROCESSING METHOD USING THE SAME SK INC. (KR) 2023-11-23 — — US disclosed
US-20230367223-A1 SUBSTRATE PROCESSING COMPOSITION AND SUBSTRATE PROCESSING METHOD USING THE SAME SK INC. (KR) 2023-11-16 — — US disclosed
US-20220059345-A1 METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING A METAL-CONTAINING PHOTORESIST COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2022-02-24 — — US disclosed
EP-2935495-B1 PRESSURE-SENSITIVE ADHESIVES PREPARED FROM DEGRADABLE MONOMERS AND POLYMERS 3M INNOVATIVE PROPERTIES CO (US) 2019-10-09 — — EP disclosed
US-9334428-B2 Pressure-sensitive adhesives prepared from degradable monomers and polymers 3M INNOVATIVE PROPERTIES COMPANY (US) 2016-05-10 — — US disclosed
US-20150337179-A1 PRESSURE-SENSITIVE ADHESIVES PREPARED FROM DEGRADABLE MONOMERS AND POLYMERS 3M INNOVATIVE PROPERTIES COMPANY 2015-11-26 — — US disclosed
EP-2935495-A1 PRESSURE-SENSITIVE ADHESIVES PREPARED FROM DEGRADABLE MONOMERS AND POLYMERS 3M Innovative Properties Company (US) 2015-10-28 — — EP disclosed
WO-2014099300-A1 PRESSURE-SENSITIVE ADHESIVES PREPARED FROM DEGRADABLE MONOMERS AND POLYMERS 3M INNOVATIVE PROPERTIES COMPANY (US) 2014-06-26 — — WO disclosed
US-6194580-B1 REACTING CARBOXYLIC ACID DERIVATIVE WITH CONDENSING AGENT SUCH AS DICYCLOHEXYCARBODIMIDE FORM ACYL HETEROAROMATIC COMPOUND; REACTING WITH CAMPTOTHECIN AND CAMPTOTHECIN DERIVATIVE IN PRESENCE LANTHANIDE METAL CATALYST TO FORM ESTER COMPOUND ENZON, INC. 2001-02-27 — — US disclosed
US-6111107-A FORMING ESTERS OF CAMPTOTHECIN OR CAMPTOTHECIN DERIVATIVES BY ACYLATION WITH AN ACYL HETEROAROMATIC ION-BASED COMPOUND USING A LANTHANIDE METAL-BASED CATALYST; PRODRUGS; STEREOSELECTIVE ENZON, INC. (US) 2000-08-29 — — US disclosed
JP-S6456772-A PAINT FOR PLASTIC NIPPON POLYURETHANE KOGYO KK 1989-03-03 — — JP disclosed
Send feedback