Ethane

Ethane

SCHEMBL7940564

CC.CC(C)(O)C(=O)O

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29373 0.96
SCHEMBL1618313 0.96 ALDH1A1 (1.00)
SCHEMBL28402001 0.92
SCHEMBL10458538 0.92 ALDH1A1 (0.92)
SCHEMBL8940464 0.92
SCHEMBL11327880 0.92
Ammonia Solution, Strong SCHEMBL1782484 0.92
SCHEMBL6756839 0.92
SCHEMBL9323495 0.92
Methane SCHEMBL284453 0.92

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6291385-B1 Catalyst for polymerization or copolymerization of olefin SAMSUNG GENERAL CHEMICALS CO., LTD. (KR) 2001-09-18 US claimed
JP-1056772-A None JP disclosed
US-20230375937-A1 SUBSTRATE PROCESSING COMPOSITION AND SUBSTRATE PROCESSING METHOD USING THE SAME SK INC. (KR) 2023-11-23 US disclosed
US-20230367223-A1 SUBSTRATE PROCESSING COMPOSITION AND SUBSTRATE PROCESSING METHOD USING THE SAME SK INC. (KR) 2023-11-16 US disclosed
US-20220059345-A1 METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING A METAL-CONTAINING PHOTORESIST COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2022-02-24 US disclosed
EP-2935495-B1 PRESSURE-SENSITIVE ADHESIVES PREPARED FROM DEGRADABLE MONOMERS AND POLYMERS 3M INNOVATIVE PROPERTIES CO (US) 2019-10-09 EP disclosed
US-9334428-B2 Pressure-sensitive adhesives prepared from degradable monomers and polymers 3M INNOVATIVE PROPERTIES COMPANY (US) 2016-05-10 US disclosed
US-20150337179-A1 PRESSURE-SENSITIVE ADHESIVES PREPARED FROM DEGRADABLE MONOMERS AND POLYMERS 3M INNOVATIVE PROPERTIES COMPANY 2015-11-26 US disclosed
EP-2935495-A1 PRESSURE-SENSITIVE ADHESIVES PREPARED FROM DEGRADABLE MONOMERS AND POLYMERS 3M Innovative Properties Company (US) 2015-10-28 EP disclosed
WO-2014099300-A1 PRESSURE-SENSITIVE ADHESIVES PREPARED FROM DEGRADABLE MONOMERS AND POLYMERS 3M INNOVATIVE PROPERTIES COMPANY (US) 2014-06-26 WO disclosed
US-6194580-B1 REACTING CARBOXYLIC ACID DERIVATIVE WITH CONDENSING AGENT SUCH AS DICYCLOHEXYCARBODIMIDE FORM ACYL HETEROAROMATIC COMPOUND; REACTING WITH CAMPTOTHECIN AND CAMPTOTHECIN DERIVATIVE IN PRESENCE LANTHANIDE METAL CATALYST TO FORM ESTER COMPOUND ENZON, INC. 2001-02-27 US disclosed
US-6111107-A FORMING ESTERS OF CAMPTOTHECIN OR CAMPTOTHECIN DERIVATIVES BY ACYLATION WITH AN ACYL HETEROAROMATIC ION-BASED COMPOUND USING A LANTHANIDE METAL-BASED CATALYST; PRODRUGS; STEREOSELECTIVE ENZON, INC. (US) 2000-08-29 US disclosed
JP-S6456772-A PAINT FOR PLASTIC NIPPON POLYURETHANE KOGYO KK 1989-03-03 JP disclosed