⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28448614 | 0.93 | ALDH1A1 (0.35) | — | |
| SCHEMBL22661046 | 0.88 | CYP3A4 (0.30) | — | |
| SCHEMBL3299985 | 0.87 | TSHR (0.35) | — | |
| SCHEMBL3300505 | 0.85 | — | — | |
| SCHEMBL8467344 | 0.83 | MEN1 (0.36) | — | |
| SCHEMBL707612 | 0.82 | — | — | |
| SCHEMBL22661039 | 0.82 | ALDH1A1 (0.34) | — | |
| SCHEMBL23071170 | 0.81 | CYP3A4 (0.36) | — | |
| SCHEMBL3297080 | 0.80 | — | — | |
| SCHEMBL27387472 | 0.80 | DNM1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116075368-A | Resin composition, cured product, method for producing same, and laminate | 三菱化学株式会社 | 2023-05-05 | — | — | CN | disclosed |
| CN-108389512-B | Laminate, flexible device, and method for producing laminate | 东京应化工业株式会社 | 2022-04-15 | — | — | CN | disclosed |
| CN-108250754-B | Silicon-containing resin composition, silicon-containing resin film, silica film, light-emitting display element panel, and light-emitting display device | 东京应化工业株式会社 | 2022-01-25 | — | — | CN | disclosed |
| CN-108387954-B | Laminate, flexible device, and method for producing laminate | 东京应化工业株式会社 | 2022-01-18 | — | — | CN | disclosed |
| CN-107429059-B | Energy-sensitive resin composition | 东京应化工业株式会社 | 2020-10-23 | — | — | CN | disclosed |
| CN-107922733-B | Polyimide precursor composition | 东京应化工业株式会社 | 2020-09-11 | — | — | CN | disclosed |