SCHEMBL28489683

SCHEMBL28489683

Cc1ccc(Oc2cccc3cc4cc5ccccc5cc4cc23)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 2/20 0.45
SLC6A4 P31645 2/20 0.45
LMNA P02545 1/20 0.44
HTT P42858 4/20 0.41
ALDH1A1 P00352 3/20 0.41
L3MBTL1 Q9Y468 2/20 0.41
MAPK1 P28482 1/20 0.41
GAA P10253 2/20 0.40
NQO1 P15559 1/20 0.40
TDP1 Q9NUW8 2/20 0.39
CYP2A6 P11509 1/20 0.39
CYP1A2 P05177 1/20 0.39
RCE1 Q9Y256 1/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
NPC1 O15118 1/20 0.38
HPGD P15428 1/20 0.38
RAB9A P51151 1/20 0.38
ATM Q13315 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3464859 0.89 GAA (0.46) LMNAHTTALDH1A1L3MBTL1MAPK1
SCHEMBL1441005 0.85 CTNNB1 (0.43) SLC6A4LMNAALDH1A1L3MBTL1GAA
SCHEMBL29080842 0.85 ALDH1A1 (0.58) LMNAHTTALDH1A1L3MBTL1GAA
SCHEMBL8737442 0.84 SLC6A4 (0.49) HTR2ASLC6A4LMNAHTTALDH1A1
SCHEMBL445495 0.83 CTNNB1 (0.44) SLC6A4LMNAALDH1A1L3MBTL1GAA
SCHEMBL9616917 0.83 NQO1 (0.45) HTR2AALDH1A1L3MBTL1GAANQO1
SCHEMBL31474285 0.83 NQO1 (0.45) HTR2AALDH1A1L3MBTL1GAANQO1
SCHEMBL29039546 0.83 ALDH1A1 (0.60) LMNAHTTALDH1A1L3MBTL1GAA
SCHEMBL9693541 0.81 GAA (0.49) LMNAHTTALDH1A1L3MBTL1GAA
SCHEMBL9693024 0.81 LTA4H (0.46) SLC6A4LMNAALDH1A1L3MBTL1GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109471330-B Photosensitive composition and photopolymerization initiator used therein 东京应化工业株式会社 2023-08-29 CN disclosed
CN-111796482-A Photosensitive resin composition, method for producing patterned cured film, and patterned cured film 东京应化工业株式会社 2020-10-20 CN disclosed