SCHEMBL28493147

SCHEMBL28493147

CCCC(C#N)c1ccc(O)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 16/20 0.59
▸ ESR2 Q92731 15/20 0.59
▸ CYP1A2 P05177 2/20 0.59
▸ CYP3A4 P08684 2/20 0.59
▸ CYP2C9 P11712 2/20 0.59
▸ CYP2C19 P33261 2/20 0.59
▸ MEN1 O00255 1/20 0.59
▸ ALDH1A1 P00352 1/20 0.59
▸ KMT2A Q03164 1/20 0.59
▸ LMNA P02545 1/20 0.45
▸ PGR P06401 1/20 0.45
▸ CHRM2 P08172 1/20 0.45
▸ ADORA3 P0DMS8 1/20 0.45
▸ AR P10275 1/20 0.45
▸ CYP2D6 P10635 1/20 0.45
▸ MAPT P10636 1/20 0.45
▸ CHRM1 P11229 1/20 0.45
▸ ALOX15 P16050 1/20 0.45
▸ DRD1 P21728 1/20 0.45
▸ TBXA2R P21731 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10579894 0.86 ESR1 (0.53) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL7099557 0.84 ESR1 (0.63) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL7294325 0.81 CCR1 (0.45) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL6886211 0.81 ESR1 (0.49) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL3169272 0.81 ESR2 (0.46) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL10468320 0.81 KMT2A (0.43) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL27890584 0.81 ALDH1A1 (0.40) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL22668044 0.80 ESR1 (0.54) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL953748 0.80 TRPA1 (0.43) ESR1ESR2CYP1A2CYP3A4CYP2C9
SCHEMBL28607173 0.79 ESR1 (0.64) ESR1ESR2CYP1A2CYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112041165-B Additive manufacturing with efficient sintering using photothermal dyes 株式会社理光 2024-01-09 — — CN disclosed
CN-112041165-A Additive manufacturing using photothermal dyes for high efficiency sintering 株式会社理光 2020-12-04 — — CN disclosed
CN-107129659-B Method for solid freeform fabrication 株式会社理光 2020-11-24 — — CN disclosed
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