SCHEMBL285120

SCHEMBL285120

C(CC1CCC2OC12)C1CCC2OC12

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21391306 0.85
SCHEMBL718922 0.85
SCHEMBL4457388 0.83
SCHEMBL15315784 0.79 SIGMAR1 (0.31)
SCHEMBL15315789 0.79 SIGMAR1 (0.31)
SCHEMBL7089291 0.78
SCHEMBL7089295 0.78
SCHEMBL18434989 0.73
SCHEMBL11318861 0.72
SCHEMBL6344634 0.72 KDM4E (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2005019297-A1 CURABLE COMPOSITIONS OF ACYL EPOXIDES, CYCLOALIPHATIC EPOXIDES, AND ARYL POLYOLS, AND NETWORK POLYMERS THEREFROM DOW GLOBAL TECHNOLOGIES INC. (US) 2005-03-03 WO claimed
EP-3559073-B1 LATENT CURING ACCELERATORS HUNTSMAN ADV MAT SWITZERLAND (CH) 2026-04-08 EP disclosed
EP-4605210-A1 METHOD TO AVOID CRACKS IN ENCAPSULATION OF SHARP-EDGED INSERTS Huntsman Advanced Materials (Switzerland) GmbH (CH) 2025-08-27 EP disclosed
CN-120076913-A Method for avoiding cracks in the encapsulation of sharp-edged inserts 亨斯迈先进材料(瑞士)有限公司 2025-05-30 CN disclosed
CN-115867588-B Photocurable composition 亨斯迈先进材料(瑞士)有限公司 2025-02-25 CN disclosed
CN-118240175-A Latent curing accelerator 亨斯迈先进材料许可(瑞士)有限公司 2024-06-25 CN disclosed
WO-2024083741-A1 METHOD TO AVOID CRACKS IN ENCAPSULATION OF SHARP-EDGED INSERTS HUNTSMAN ADVANCED MATERIALS LICENSING (SWITZERLAND) GMBH (CH) 2024-04-25 WO disclosed
US-20240093022-A1 Curable Two-Part Resin System HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2024-03-21 US disclosed
US-11926727-B2 Epoxy resin composition HUNTSMAN INTERNATIONAL LLC (US) 2024-03-12 US disclosed
EP-4267646-A1 CURABLE TWO-PART RESIN SYSTEM Huntsman Advanced Materials Licensing (Switzerland) GmbH (CH) 2023-11-01 EP disclosed
EP-0899304-B1 Hydrophobic epoxy resin composition HUNTSMAN ADV MAT SWITZERLAND (CH) 2005-03-16 EP disclosed
WO-2005019297-A1 CURABLE COMPOSITIONS OF ACYL EPOXIDES, CYCLOALIPHATIC EPOXIDES, AND ARYL POLYOLS, AND NETWORK POLYMERS THEREFROM DOW GLOBAL TECHNOLOGIES INC. (US) 2005-03-03 WO disclosed
EP-1352026-B1 FILLED EPOXY RESIN SYSTEM HAVING HIGH MECHANICAL STRENGTH VALUES VANTICO AG (CH) 2004-07-21 EP disclosed
US-6764616-B1 BLEND OF EPOXY RESIN, POLYSILOXANE, CYCLIC POLYSILOXANE, AND FLUOROALIPHATIC NONIONIC SURFACTANT; DIELECTRICS HUNTSMAN ADVANCED MATERIALS AMERICAS INC. 2004-07-20 US disclosed
US-20040039084-A1 Filled epoxy resin system having high mechanical strength values DEUTSCHE BANK AG NEW YORK BRANCH, AS AGENT 2004-02-26 US disclosed
US-6638567-B1 Cycloaliphatic epoxy resin liquid at room temperature suspended in core/shell polymer; polycarboxylic anhydride and fillers; fireproof VANTICO, INC. 2003-10-28 US disclosed
EP-1141127-B1 HYDROPHOBIC EPOXIDE RESIN SYSTEM VANTICO AG (CH) 2003-02-05 EP disclosed
US-6194490-B1 MIXTURES OF EPOXIDES WITH ANHYDRIDES AND CURING VANTICO, INC. 2001-02-27 US disclosed
US-6048946-A POLYSILOXANES, CYCLOALIPHATIC EPOXY RESINS, POLYETHERS AND CYCLIC POLYSILOXANES CIBA SPECIALTY CHEMICALS CORP. (US) 2000-04-11 US disclosed
EP-0899304-A2 Hydrophobic epoxy resin composition Ciba SC Holding AG (CH) 1999-03-03 EP disclosed