SCHEMBL28518995

SCHEMBL28518995

CCNC(=N)NC(=N)N.c1cc2cc-2c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PRSS1 P07477 1/20 0.37
PRSS2 P07478 1/20 0.37
PRSS3 P35030 1/20 0.37
AOC3 Q16853 2/20 0.33
GRIN2D O15399 2/20 0.33
GRIN3B O60391 2/20 0.33
GRIN1 Q05586 2/20 0.33
GRIN2A Q12879 2/20 0.33
GRIN2B Q13224 2/20 0.33
GRIN2C Q14957 2/20 0.33
GRIN3A Q8TCU5 2/20 0.33
CDK8 P49336 1/20 0.32
F2 P00734 2/20 0.32
MEN1 O00255 1/20 0.31
ESR1 P03372 1/20 0.31
KMT2A Q03164 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
C1S P09871 1/20 0.31
F9 P00740 1/20 0.31
MKNK1 Q9BUB5 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2236526 0.81
Biguanide SCHEMBL28864824 0.79 PRSS1 (0.48) PRSS1PRSS2PRSS3F2MEN1
Hydrochloric Acid SCHEMBL1937669 0.79 ALDH1A1 (0.32)
SCHEMBL15443053 0.74 AOC3 (0.42) AOC3CDK8MEN1KMT2ASMN1; SMN2
M-Xylene SCHEMBL29074382 0.69 ACHE (0.46) PRSS1PRSS2PRSS3GRIN2DGRIN3B
Buformin SCHEMBL9643339 0.69 SMN1; SMN2 (0.41) PRSS1PRSS2PRSS3GRIN2DGRIN3B
SCHEMBL18643455 0.69 TAAR1 (0.50) APP
M-Xylene SCHEMBL29074417 0.68 TAAR1 (0.45) PRSS1PRSS2PRSS3GRIN2DGRIN3B
SCHEMBL17198913 0.68 ALDH1A1 (0.49) MEN1KMT2ASMN1; SMN2
Ethylamine SCHEMBL28585991 0.68 CYP1A1 (0.42) MEN1ESR1KMT2AAPP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115746855-A Treatment liquid 富士胶片株式会社 2023-03-07 CN disclosed
CN-114364780-A Treatment liquid, kit, method for producing treatment liquid, method for cleaning substrate, and method for treating substrate 富士胶片株式会社 2022-04-15 CN disclosed
CN-108485840-B Cleaning formulation for removing residues on surfaces 富士胶片电子材料美国有限公司 2020-12-29 CN disclosed