Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B3 | P37058 | 8/20 | 0.59 |
| ▸ | HTR7 | P34969 | 1/20 | 0.57 |
| ▸ | STS | P08842 | 4/20 | 0.48 |
| ▸ | USP5 | P45974 | 1/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | THRA | P10827 | 1/20 | 0.43 |
| ▸ | THRB | P10828 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28523316 | 0.95 | HSD17B3 (0.60) | HSD17B3HTR7STSUSP5THRA | |
| SCHEMBL28510509 | 0.90 | HSD17B3 (0.56) | HSD17B3HTR7STSUSP5L3MBTL1 | |
| SCHEMBL11484918 | 0.88 | HSD17B3 (0.61) | HSD17B3HTR7STSUSP5L3MBTL1 | |
| SCHEMBL5566974 | 0.84 | USP5 (0.66) | HSD17B3HTR7STSUSP5L3MBTL1 | |
| SCHEMBL28523325 | 0.82 | L3MBTL1 (0.48) | USP5L3MBTL1 | |
| SCHEMBL13144201 | 0.82 | HSD17B3 (0.63) | HSD17B3HTR7STSUSP5L3MBTL1 | |
| SCHEMBL14522305 | 0.82 | HSD17B3 (0.83) | HSD17B3HTR7STSL3MBTL1NPC1 | |
| SCHEMBL30871980 | 0.79 | HSD17B3 (0.66) | HSD17B3HTR7STSUSP5L3MBTL1 | |
| SCHEMBL8501819 | 0.79 | HSD17B3 (0.63) | HSD17B3HTR7STSUSP5THRA | |
| SCHEMBL9647753 | 0.78 | HSD17B3 (0.61) | HSD17B3HTR7STSUSP5L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107924123-B | Material for lithography, method for producing same, composition for lithography, method for forming pattern, compound, resin, and method for purifying same | 学校法人关西大学 | 2021-08-06 | — | — | CN | disclosed |
| CN-107428717-B | Resist composition, resist pattern forming method, and polyphenol compound used for same | 三菱瓦斯化学株式会社 | 2021-04-23 | — | — | CN | disclosed |
| CN-108008600-B | Radiation-sensitive composition | 三菱瓦斯化学株式会社 | 2021-02-09 | — | — | CN | disclosed |