Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MCL1 | Q07820 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | KDM1A | O60341 | 2/20 | 0.37 |
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17439629 | 0.94 | MCL1 (0.38) | MCL1MAPTALDH1A1LMNAKDM4E | |
| SCHEMBL487348 | 0.94 | MCL1 (0.44) | MCL1MAPTALDH1A1LMNAKDM4E | |
| SCHEMBL17439628 | 0.91 | MCL1 (0.40) | MCL1MAPTALDH1A1LMNAKDM4E | |
| Ethoxycarbonyl Group SCHEMBL27635081 | 0.75 | KDM4E (0.38) | MAPTALDH1A1LMNAKDM4EHPGD | |
| SCHEMBL8530826 | 0.73 | FBP1 (0.45) | — | |
| SCHEMBL28442251 | 0.73 | LMNA (0.49) | MAPTALDH1A1LMNAKDM1AMAPK1 | |
| SCHEMBL5413534 | 0.71 | LMNA (0.39) | MAPTALDH1A1LMNAHPGDKDM1A | |
| SCHEMBL10776462 | 0.69 | LMNA (0.41) | MAPTALDH1A1LMNAHPGDKDM1A | |
| SCHEMBL18365438 | 0.68 | — | — | |
| SCHEMBL10406119 | 0.68 | GSTP1 (0.48) | MCL1MAPTALDH1A1KDM4EHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112470254-A | Method for producing molded article, resist for co-molding in imprint-electron lithography, method for producing replica mold, method for producing device, and imprint material | 学校法人东京理科大学 | 2021-03-09 | — | — | CN | disclosed |