SCHEMBL285383

SCHEMBL285383

SCc1ccc(Oc2ccc(CS)cc2)cc1

nearest known ligand 0.64

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 6/20 0.64
ST14 Q9Y5Y6 1/20 0.48
LTA4H P09960 3/20 0.46
TSHR P16473 2/20 0.41
ALDH1A1 P00352 1/20 0.41
CYP3A4 P08684 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41
FFAR1 O14842 1/20 0.39
SRD5A2 P31213 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10605860 0.90 LTA4H (0.61) IDO1LTA4HTSHRFFAR1SRD5A2
SCHEMBL4639745 0.88 IDO1 (0.73) IDO1ST14LTA4H
SCHEMBL21815509 0.83 IDO1 (0.58) IDO1ST14LTA4HALDH1A1MEN1
SCHEMBL127369 0.80 IDO1 (0.69) IDO1TSHRALDH1A1CYP3A4TDP1
SCHEMBL6684538 0.78 IDO1 (0.58) IDO1ST14
SCHEMBL61391 0.78 IDO1 (1.00) IDO1LTA4HTSHRALDH1A1CYP3A4
SCHEMBL23963856 0.78 IDO1 (0.58) IDO1ST14LTA4H
SCHEMBL9775401 0.76 IDO1 (0.45) IDO1ST14LTA4H
SCHEMBL6624908 0.76 IDO1 (0.95) IDO1LTA4HTSHRALDH1A1CYP3A4
Hydrochloric Acid SCHEMBL5797444 0.76 IDO1 (0.95) IDO1LTA4HTSHRALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2007 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260008903-A1 POLYTHIOL COMPOSITION AND USE THEREOF Efirm New Material Co., Ltd. (CN) 2026-01-08 US claimed
CN-116768847-B Thiol composition and application thereof in optical material 益丰新材料股份有限公司 2025-04-29 CN claimed
CN-119751323-A Preparation method of polythiol compound 益丰新材料股份有限公司 2025-04-04 CN claimed
CN-118684609-A Polythiol compound for avoiding explosion polymerization and material leakage and application thereof 益丰新材料股份有限公司 2024-09-24 CN claimed
WO-2024188359-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2024-09-19 WO claimed
CN-117285688-B Polythiol composition and application thereof 益丰新材料股份有限公司 2024-08-30 CN claimed
CN-118063723-A Polythiol composition, preparation method and application thereof, and optical material 益丰新材料股份有限公司 2024-05-24 CN claimed
CN-117326997-A Polythiol compound, composition for optical material, and preparation method and application thereof 益丰新材料股份有限公司 2024-01-02 CN claimed
CN-117304082-A Polythiol compound for optical resin lens, optical resin lens and preparation method of optical resin lens 益丰新材料股份有限公司 2023-12-29 CN claimed
CN-117285688-A Polythiol composition and application thereof 益丰新材料股份有限公司 2023-12-26 CN claimed
CN-117186057-A Polythiol composition and application thereof 益丰新材料股份有限公司 2023-12-08 CN claimed
CN-116768847-A Thiol composition and application thereof in optical material 益丰新材料股份有限公司 2023-09-19 CN claimed
CN-116640361-A Release agent composition and application thereof 益丰新材料股份有限公司 2023-08-25 CN claimed
WO-2023147792-A1 POLYTHIOL COMPOSITION AND USE THEREOF 益丰新材料股份有限公司 2023-08-10 WO claimed
CN-114790269-B Polythiol composition and application thereof 益丰新材料股份有限公司 2023-03-10 CN claimed
CN-114790269-A Polythiol composition and application thereof 益丰新材料股份有限公司 2022-07-26 CN claimed
US-11377433-B2 Method for producing polyfunctional sulfur-containing epoxy compound MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2022-07-05 US claimed
CN-102618021-B The purposes of molding compounds LANXESS DEUTSCHLAND GMBH (DE) 2016-05-11 CN claimed
US-9315698-B2 Indicator for cure of two-component-epoxy adhesives HENKEL AG & CO. KGAA (DE) 2016-04-19 US claimed
US-6117923-A OXIDATION RESISTANCE. POLYMERIZING A NOVEL SULFUR-CONTAINING COMPOUND HAVING AN EPISULFIDE STRUCTURE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2000-09-12 US claimed