SCHEMBL2853994

SCHEMBL2853994

COc1cc2c(cc1OC)CSC2

nearest known ligand 0.59

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.59
MAPT P10636 2/20 0.59
LMNA P02545 1/20 0.44
MAOA P21397 6/20 0.42
KDM4E B2RXH2 5/20 0.42
CHRNA7 P36544 2/20 0.42
MAOB P27338 2/20 0.42
SLC6A4 P31645 1/20 0.42
KMT2A Q03164 1/20 0.41
ALDH1A1 P00352 5/20 0.39
GLA P06280 2/20 0.39
GAA P10253 2/20 0.39
ACHE P22303 1/20 0.39
CYP2D6 P10635 1/20 0.38
CYP2C9 P11712 1/20 0.38
ALOX15 P16050 1/20 0.38
MAPK1 P28482 1/20 0.38
TSHR P16473 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17752758 0.80 MAPT (0.43) CYP3A4MAPTLMNAMAOAKDM4E
SCHEMBL17752769 0.80 MAPT (0.43) CYP3A4MAPTLMNAMAOAKDM4E
SCHEMBL17752759 0.80 MAPT (0.43) CYP3A4MAPTLMNAMAOAKDM4E
SCHEMBL17752757 0.80 MAPT (0.43) CYP3A4MAPTLMNAMAOAKDM4E
SCHEMBL4571013 0.75 CYP3A4 (1.00) CYP3A4MAPTMAOAKDM4ECHRNA7
SCHEMBL14481557 0.75 MAPT (0.68) CYP3A4MAPTMAOAKDM4ECHRNA7
SCHEMBL2594537 0.75 MAPT (0.68) CYP3A4MAPTMAOAKDM4ECHRNA7
SCHEMBL22953335 0.75 CYP3A4 (1.00) CYP3A4MAPTMAOAKDM4ECHRNA7
SCHEMBL29924708 0.75 MAPT (0.68) CYP3A4MAPTMAOAKDM4ECHRNA7
SCHEMBL2138785 0.75 CYP3A4 (1.00) CYP3A4MAPTMAOAKDM4ECHRNA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6807049-B2 SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER SHOWA DENKO K.K. (JP) 2004-10-19 US claimed
US-20020039274-A1 SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER SHOWA DENKO K.K. 2002-04-04 US claimed
US-20020034060-A1 VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING SHOWA DENKO K.K. 2002-03-21 US claimed
EP-0971382-A1 SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF Showa Denko K K (JP) 2000-01-12 EP claimed
EP-2146359-B1 Solid electrolytic capacitor and method for producing the same MURATA MANUFACTURING CO (JP) 2012-05-16 EP disclosed
EP-2146359-A1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 2010-01-20 EP disclosed
EP-1988556-B1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO KK (JP) 2010-01-13 EP disclosed
EP-0971382-B1 SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF SHOWA DENKO KK (JP) 2009-04-22 EP disclosed
EP-1988556-A2 Solid electrolytic capacitor and method for producing the same Showa Denko K.K. (JP) 2008-11-05 EP disclosed
US-7175781-B2 Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance SHOWA DENKO K.K. (JP) 2007-02-13 US disclosed
US-7175781-B2 Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance SHOWA DENKO K.K. (JP) 2007-02-13 US disclosed
US-20050030703-A1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. 2005-02-10 US disclosed
US-6807049-B2 SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER SHOWA DENKO K.K. (JP) 2004-10-19 US disclosed
US-6790384-B2 VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING SHOWA DENKO K.K. (JP) 2004-09-14 US disclosed
US-20020039274-A1 SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER SHOWA DENKO K.K. 2002-04-04 US disclosed
US-20020034060-A1 VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING SHOWA DENKO K.K. 2002-03-21 US disclosed
US-6351370-B1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. (JP) 2002-02-26 US disclosed
EP-0971382-A1 SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF Showa Denko K K (JP) 2000-01-12 EP disclosed
US-4795242-A ELECTROCONDUCTIVITY UNIVERSITY OF CALIFORNIA (US) 1989-01-03 US disclosed
EP-0273643-A2 Conducting substituted polyisothianophthenes THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 1988-07-06 EP disclosed