SCHEMBL28558271

SCHEMBL28558271

CC1(C)NC(=O)N(Cc2ccc(C(C)(C)C)cc2)C1=O

nearest known ligand 0.56

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
AR P10275 1/20 0.56
HDAC6 Q9UBN7 2/20 0.49
POLB P06746 2/20 0.49
ALDH1A1 P00352 8/20 0.48
SMN1; SMN2 Q16637 3/20 0.45
LMNA P02545 3/20 0.45
MAPK1 P28482 1/20 0.45
GFER P55789 1/20 0.44
MAPT P10636 1/20 0.44
KMT2A Q03164 2/20 0.43
KDM4E B2RXH2 1/20 0.42
HTR1D P28221 1/20 0.41
HTR1B P28222 1/20 0.41
NPC1 O15118 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13744964 0.84 AR (0.56) ARPOLBALDH1A1SMN1; SMN2LMNA
SCHEMBL28548453 0.82 KDM4E (0.60) ARPOLBALDH1A1SMN1; SMN2LMNA
SCHEMBL28556498 0.82 ALDH1A1 (0.60) ARPOLBALDH1A1SMN1; SMN2LMNA
SCHEMBL16917804 0.81 AR (0.55) ARHDAC6POLBALDH1A1SMN1; SMN2
SCHEMBL28569597 0.81 ALDH1A1 (0.66) ARPOLBALDH1A1SMN1; SMN2LMNA
SCHEMBL19580338 0.81 AR (0.55) ARPOLBALDH1A1SMN1; SMN2LMNA
SCHEMBL28566601 0.81 CNR1 (0.56) ARPOLBALDH1A1SMN1; SMN2LMNA
SCHEMBL8498625 0.80 KMT2A (0.64) ARPOLBALDH1A1LMNAGFER
Hydrochloric Acid SCHEMBL8112561 0.79 AR (0.53) ARPOLBALDH1A1SMN1; SMN2LMNA
SCHEMBL13753311 0.79 AR (0.53) ARPOLBALDH1A1SMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112047925-B Preparation method of N- (aryl/heteroaryl) alkyl-diamide 中国科学院兰州化学物理研究所 2021-06-25 CN disclosed
CN-112047925-A Preparation method of N- (aryl/heteroaryl) alkyl-diamide 中国科学院兰州化学物理研究所 2020-12-08 CN disclosed