SCHEMBL2855933

SCHEMBL2855933

[O-][n+]1c2c([n+]([O-])c3ccccc31)C[S+]([O-])C2

nearest known ligand 0.38

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ATM Q13315 1/20 0.38
MEN1 O00255 1/20 0.38
POLB P06746 1/20 0.38
CASP6 P55212 1/20 0.38
KMT2A Q03164 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10902440 0.71 MEN1 (0.42) ATMMEN1POLBCASP6KMT2A
SCHEMBL10574223 0.71 HSD17B10 (0.41) ATMMEN1POLBCASP6KMT2A
SCHEMBL6919829 0.71 ATM (0.63) ATMMEN1POLBCASP6KMT2A
SCHEMBL29627789 0.71 ATM (0.63) ATMMEN1POLBCASP6KMT2A
SCHEMBL983009 0.70 ATM (0.39) ATMMEN1POLBCASP6KMT2A
SCHEMBL11713952 0.70 ATM (0.39) ATMMEN1POLBCASP6KMT2A
SCHEMBL14344183 0.64 ATM (0.48) ATMMEN1POLBCASP6KMT2A
SCHEMBL255960 0.64 TSHR (0.38)
SCHEMBL29255977 0.64 TSHR (0.38)
SCHEMBL10574232 0.62 ATM (0.46) ATMMEN1POLBCASP6KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2146359-B1 Solid electrolytic capacitor and method for producing the same MURATA MANUFACTURING CO (JP) 2012-05-16 EP disclosed
EP-2146359-A1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 2010-01-20 EP disclosed
EP-1988556-B1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO KK (JP) 2010-01-13 EP disclosed
EP-0971382-B1 SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF SHOWA DENKO KK (JP) 2009-04-22 EP disclosed
EP-1988556-A2 Solid electrolytic capacitor and method for producing the same Showa Denko K.K. (JP) 2008-11-05 EP disclosed
US-7175781-B2 Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance SHOWA DENKO K.K. (JP) 2007-02-13 US disclosed
US-7175781-B2 Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance SHOWA DENKO K.K. (JP) 2007-02-13 US disclosed
US-20050030703-A1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. 2005-02-10 US disclosed
US-6807049-B2 SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER SHOWA DENKO K.K. (JP) 2004-10-19 US disclosed
US-6790384-B2 VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING SHOWA DENKO K.K. (JP) 2004-09-14 US disclosed
US-20020039274-A1 SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER SHOWA DENKO K.K. 2002-04-04 US disclosed
US-20020034060-A1 VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING SHOWA DENKO K.K. 2002-03-21 US disclosed
US-6351370-B1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. (JP) 2002-02-26 US disclosed
EP-0971382-A1 SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF Showa Denko K K (JP) 2000-01-12 EP disclosed