Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTPN22 | Q9Y2R2 | 1/20 | 0.46 |
| ▸ | USP2 | O75604 | 1/20 | 0.42 |
| ▸ | PAK1 | Q13153 | 1/20 | 0.42 |
| ▸ | LDHA | P00338 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2233625 | 0.83 | PTPN22 (0.58) | PTPN22USP2PAK1LDHAPOLB | |
| SCHEMBL30187599 | 0.83 | PTPN22 (0.58) | PTPN22USP2PAK1LDHAPOLB | |
| SCHEMBL28572809 | 0.80 | PTPN22 (0.50) | PTPN22USP2PAK1LDHAMEN1 | |
| SCHEMBL11467447 | 0.76 | PTPN22 (0.54) | PTPN22USP2PAK1LDHAMEN1 | |
| SCHEMBL3198488 | 0.76 | PTPN22 (0.54) | PTPN22USP2PAK1LDHAPOLB | |
| SCHEMBL29466047 | 0.75 | PTPN22 (0.58) | PTPN22USP2PAK1LDHAPOLB | |
| SCHEMBL2434774 | 0.75 | PTPN22 (0.58) | PTPN22USP2PAK1LDHAPOLB | |
| SCHEMBL6754155 | 0.74 | PTPN22 (0.56) | PTPN22USP2PAK1LDHAPOLB | |
| SCHEMBL6035055 | 0.72 | PTPN22 (0.54) | PTPN22USP2PAK1LDHAMAPT | |
| SCHEMBL6750384 | 0.71 | LDHA (0.55) | PTPN22LDHA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107533290-B | Resist base material, resist composition, and method for forming resist pattern | 三菱瓦斯化学株式会社 | 2021-04-09 | — | — | CN | disclosed |