⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL966921 | 0.86 | — | — | |
| SCHEMBL9165639 | 0.80 | — | — | |
| SCHEMBL28989975 | 0.80 | — | — | |
| SCHEMBL16497514 | 0.80 | — | — | |
| SCHEMBL4999967 | 0.80 | — | — | |
| SCHEMBL16497335 | 0.77 | OPRM1 (0.30) | — | |
| SCHEMBL16496987 | 0.77 | — | — | |
| SCHEMBL2868916 | 0.75 | ALDH1A1 (0.30) | — | |
| SCHEMBL2472310 | 0.75 | ALDH1A1 (0.30) | — | |
| SCHEMBL16497358 | 0.75 | ALDH1A1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109715680-B | Process for preparing high cis-1, 4-polydienes with lanthanide-based catalyst compositions | 株式会社普利司通 | 2021-10-19 | — | — | CN | disclosed |
| EP-2584005-B1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF | TOSOH CORP (JP) | 2018-02-21 | — | — | EP | disclosed |
| US-20170065927-A1 | COATED MOLECULAR SIEVE | NANOSCAPE AG (DE) | 2017-03-09 | — | — | US | disclosed |
| US-8907038-B2 | Typical metal containing polysiloxane composition, process for its production, and its uses | TOSOH CORPORATION (JP) | 2014-12-09 | — | — | US | disclosed |
| EP-2584005-A1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR PRODUCTION OF SAME, AND USES THEREOF | Tosoh Corporation (JP) | 2013-04-24 | — | — | EP | disclosed |
| US-20130090447-A1 | TYPICAL METAL CONTAINING POLYSILOXANE COMPOSITION, PROCESS FOR ITS PRODUCTION, AND ITS USES | TOSOH CORPORATION (JP) | 2013-04-11 | — | — | US | disclosed |
| US-20110313184-A1 | INSULATING FILM MATERIAL, AND FILM FORMATION METHOD UTILIZING THE MATERIAL, AND INSULATING FILM | TAIYO NIPPON SANSO CORPORATION (JP) | 2011-12-22 | — | — | US | disclosed |
| EP-2054150-B1 | HYDROPHOBICALLY COATED MOLECULAR SIEVE | NANOSCAPE AG (DE) | 2010-09-29 | — | — | EP | disclosed |
| US-20100068474-A1 | COATED MOLECULAR SIEVE | NANOSCAPE AG (DE) | 2010-03-18 | — | — | US | disclosed |
| EP-2054150-A2 | COATED MOLECULAR SIEVE | Nanoscape AG (DE) | 2009-05-06 | — | — | EP | disclosed |
| WO-2008000457-A2 | COATED MOLECULAR SIEVE | NANOSCAPE AG (DE) | 2008-01-03 | — | — | WO | disclosed |