Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.37 |
| ▸ | HTR1A | P08908 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.36 |
| ▸ | GLA | P06280 | 3/20 | 0.36 |
| ▸ | HPGD | P15428 | 3/20 | 0.36 |
| ▸ | CASP1 | P29466 | 3/20 | 0.36 |
| ▸ | CASP7 | P55210 | 3/20 | 0.36 |
| ▸ | MEN1 | O00255 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.36 |
| ▸ | ACHE | P22303 | 1/20 | 0.36 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21546391 | 0.86 | PKM (0.36) | KDM4EMAPTGAA | |
| SCHEMBL21559859 | 0.76 | — | — | |
| SCHEMBL16472556 | 0.71 | CYP3A4 (0.44) | CYP3A4CHRNA7HTR1AKDM4EALDH1A1 | |
| SCHEMBL10163669 | 0.67 | CHRNA7 (0.50) | CYP3A4CHRNA7HTR1AKDM4EALDH1A1 | |
| SCHEMBL1618660 | 0.67 | CHRNA7 (0.50) | CYP3A4CHRNA7HTR1AKDM4EALDH1A1 | |
| SCHEMBL2856057 | 0.65 | CYP3A4 (0.39) | CYP3A4CHRNA7HTR1AKDM4EALDH1A1 | |
| SCHEMBL1134704 | 0.64 | CYP3A4 (0.48) | CYP3A4KDM4EALDH1A1HSD17B10MEN1 | |
| SCHEMBL6582757 | 0.63 | KDM4E (0.46) | CYP3A4CHRNA7HTR1AKDM4EALDH1A1 | |
| SCHEMBL12663048 | 0.63 | CYP3A4 (0.38) | CYP3A4CHRNA7HTR1AKDM4EALDH1A1 | |
| SCHEMBL5768129 | 0.62 | MAPT (0.47) | CYP3A4KDM4EALDH1A1HSD17B10MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6807049-B2 | SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER | SHOWA DENKO K.K. (JP) | 2004-10-19 | — | — | US | claimed |
| US-20020039274-A1 | SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER | SHOWA DENKO K.K. | 2002-04-04 | — | — | US | claimed |
| US-20020034060-A1 | VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING | SHOWA DENKO K.K. | 2002-03-21 | — | — | US | claimed |
| EP-0971382-A1 | SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF | Showa Denko K K (JP) | 2000-01-12 | — | — | EP | claimed |
| EP-2146359-B1 | Solid electrolytic capacitor and method for producing the same | MURATA MANUFACTURING CO (JP) | 2012-05-16 | — | — | EP | disclosed |
| EP-2146359-A1 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2010-01-20 | — | — | EP | disclosed |
| EP-1988556-B1 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO KK (JP) | 2010-01-13 | — | — | EP | disclosed |
| EP-0971382-B1 | SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF | SHOWA DENKO KK (JP) | 2009-04-22 | — | — | EP | disclosed |
| EP-1988556-A2 | Solid electrolytic capacitor and method for producing the same | Showa Denko K.K. (JP) | 2008-11-05 | — | — | EP | disclosed |
| US-7175781-B2 | Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance | SHOWA DENKO K.K. (JP) | 2007-02-13 | — | — | US | disclosed |
| US-7175781-B2 | Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance | SHOWA DENKO K.K. (JP) | 2007-02-13 | — | — | US | disclosed |
| US-20050030703-A1 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO K.K. | 2005-02-10 | — | — | US | disclosed |
| US-6807049-B2 | SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER | SHOWA DENKO K.K. (JP) | 2004-10-19 | — | — | US | disclosed |
| US-6790384-B2 | VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING | SHOWA DENKO K.K. (JP) | 2004-09-14 | — | — | US | disclosed |
| US-20020039274-A1 | SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER | SHOWA DENKO K.K. | 2002-04-04 | — | — | US | disclosed |
| US-20020034060-A1 | VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING | SHOWA DENKO K.K. | 2002-03-21 | — | — | US | disclosed |
| US-6351370-B1 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO K.K. (JP) | 2002-02-26 | — | — | US | disclosed |
| EP-0971382-A1 | SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF | Showa Denko K K (JP) | 2000-01-12 | — | — | EP | disclosed |