SCHEMBL285853

SCHEMBL285853

C=Cc1ccc(F)c(F)c1F

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CES2 O00748 2/20 0.36
CES1 P23141 2/20 0.36
ALDH1A1 P00352 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29620248 1.00 CES2 (0.36) CES2CES1ALDH1A1
Boric Acid SCHEMBL28586833 0.89 CES2 (0.34) CES2CES1
Potassium Ion SCHEMBL28586831 0.89 CES2 (0.30) CES2CES1
1,1-Dichloroethene SCHEMBL8679750 0.89 CES2 (0.34) CES2CES1ALDH1A1
Phosphonic Acid SCHEMBL15163686 0.87 CES2 (0.38) CES2CES1ALDH1A1
SCHEMBL16933877 0.80 ALDH1A1 (0.30) ALDH1A1
SCHEMBL19655044 0.78 ERN1 (0.42)
SCHEMBL15582383 0.78 ERN1 (0.38) CES2CES1
SCHEMBL22932036 0.78 ALDH1A1 (0.38) ALDH1A1
SCHEMBL970210 0.78 ESR1 (0.31) CES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3255 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6352782-B1 None US claimed
EP-4707920-A1 NANOIMPRINT RESIST Epinovatech AB (SE) 2026-03-11 EP claimed
US-20240352163-A1 Preparation Method for Polytrifluorostyrene CHANGSHU 3F ZHONGHAO NEW CHEMICAL MATERIALS CO., LTD. (CN) 2024-10-24 US claimed
CN-118553945-A All-vanadium redox flow battery diaphragm and preparation method thereof 西安蓝晓科技新材料股份有限公司 2024-08-27 CN claimed
CN-114085125-B Method for preparing trifluorostyrene compound by continuous method 常熟三爱富中昊化工新材料有限公司 2024-07-02 CN claimed
CN-118271501-A Maleimide heat-resistant flame-retardant modifier, heat-resistant flame-retardant ABS and preparation method thereof 浙江烯苯醇新材料科技有限公司 2024-07-02 CN claimed
CN-114361475-B Preparation method of gas diffusion electrode 安徽熵卡科技有限公司 2024-05-17 CN claimed
EP-4348736-A1 PROTON EXCHANGE MEMBRANE ARKEMA FRANCE (FR) 2024-04-10 EP claimed
EP-4348737-A1 PROTON EXCHANGE MEMBRANE ARKEMA FRANCE (FR) 2024-04-10 EP claimed
CN-117567667-A Emulsifier composition and method for preparing polytrifluorostyrene 上海华谊三爱富新材料有限公司 2024-02-20 CN claimed
EP-0882088-A1 $g(a),$g(b),$g(b)-TRIFLUOROSTYRENE-BASED AND SUBSTITUTED $g(a),$g(b),$g(b)-TRIFLUOROSTYRENE-BASED COMPOSITE MEMBRANES BALLARD POWER SYSTEMS INC. (CA) 1998-12-09 EP claimed
US-5698361-A DIAZONIUM COMPOUND, POLYMERIC BINDER; DURABILITY FUJI PHOTO FILM CO., LTD. (JP) 1997-12-16 US claimed
WO-1997025369-A1 α,β,β-TRIFLUOROSTYRENE-BASED AND SUBSTITUTED α,β,β-TRIFLUOROSTYRENE-BASED COMPOSITE MEMBRANES BALLARD POWER SYSTEMS INC. (CA) 1997-07-17 WO claimed
EP-0467933-B1 USE OF TRANSPARENT THERMOPLASTIC MOULDING MATERIAL FOR THE PRODUCTION OF BEAM WAVEGUIDES HOECHST AG (DE) 1994-10-12 EP claimed
US-5301254-A Beam waveguide; sheath of polymer of tetrafluoroethylene and a perfluorovinyl ether monomer HOECHST AKTIENGESELLSCHAFT (DE) 1994-04-05 US claimed
US-5213938-A Oxidation of toner compositions XEROX CORPORATION (US) 1993-05-25 US claimed
US-4423089-A LATEX COPOLYMER CONSISTING OF DIOLEFIN, MONOVINYL MONOMER, AND POLYVINYL OR ACRYOYL MONOMER FUJI PHOTO FILM CO., LTD. (JP) 1983-12-27 US claimed
US-4191811-A OXIDATION RESISTANCE Ionics, Incorported (US) 1980-03-04 US claimed
US-4113922-A TRIFLUOROSTYRENE SULFONIC ACID MEMBRANES HOOKER CHEMICALS & PLASTICS CORP. (US) 1978-09-12 US claimed
US-4012303-A USEFUL IN ELECTROCHEMICAL CELLS HOOKER CHEMICALS & PLASTICS CORPORATION (US) 1977-03-15 US claimed