Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | S1PR3 | Q99500 | 1/20 | 0.40 |
| ▸ | SLC2A1 | P11166 | 5/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.33 |
| ▸ | BCL2A1 | Q16548 | 2/20 | 0.33 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.33 |
| ▸ | PSEN1 | P49768 | 1/20 | 0.33 |
| ▸ | PSEN2 | P49810 | 1/20 | 0.33 |
| ▸ | APH1B | Q8WW43 | 1/20 | 0.33 |
| ▸ | NCSTN | Q92542 | 1/20 | 0.33 |
| ▸ | APH1A | Q96BI3 | 1/20 | 0.33 |
| ▸ | PSENEN | Q9NZ42 | 1/20 | 0.33 |
| ▸ | CTSD | P07339 | 1/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrabuthylammonium SCHEMBL2859336 | 0.89 | MAPK1 (0.39) | SLC2A1MAPK1KDM4EALDH1A1SMN1; SMN2 | |
| Butylamine SCHEMBL27515190 | 0.86 | SLC2A1 (0.40) | S1PR3SLC2A1MAPK1KDM4EALDH1A1 | |
| SCHEMBL29432545 | 0.85 | ALDH1A1 (0.52) | SLC2A1MAPK1KDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL29868203 | 0.85 | ALDH1A1 (0.52) | SLC2A1MAPK1KDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL601324 | 0.85 | ALDH1A1 (0.52) | SLC2A1MAPK1KDM4EALDH1A1SMN1; SMN2 | |
| Iodide SCHEMBL3838572 | 0.84 | ALDH1A1 (0.50) | SLC2A1MAPK1KDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL2858131 | 0.84 | ALDH1A1 (0.50) | SLC2A1MAPK1KDM4EALDH1A1SMN1; SMN2 | |
| Iodide SCHEMBL3838568 | 0.84 | ALDH1A1 (0.50) | SLC2A1MAPK1KDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL5147506 | 0.81 | ALDH1A1 (0.43) | MAPK1KDM4EALDH1A1SMN1; SMN2LMNA | |
| SCHEMBL2858146 | 0.81 | S1PR3 (0.54) | S1PR3SLC2A1ALDH1A1LMNAPTPN11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2146359-B1 | Solid electrolytic capacitor and method for producing the same | MURATA MANUFACTURING CO (JP) | 2012-05-16 | — | — | EP | disclosed |
| EP-2146359-A1 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2010-01-20 | — | — | EP | disclosed |
| EP-1988556-B1 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO KK (JP) | 2010-01-13 | — | — | EP | disclosed |
| EP-0971382-B1 | SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF | SHOWA DENKO KK (JP) | 2009-04-22 | — | — | EP | disclosed |
| EP-1988556-A2 | Solid electrolytic capacitor and method for producing the same | Showa Denko K.K. (JP) | 2008-11-05 | — | — | EP | disclosed |
| EP-1811532-A2 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2007-07-25 | — | — | EP | disclosed |
| EP-1190426-B1 | SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR PRODUCING THE SAME | SHOWA DENKO KK (JP) | 2007-05-30 | — | — | EP | disclosed |
| US-7175781-B2 | Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance | SHOWA DENKO K.K. (JP) | 2007-02-13 | — | — | US | disclosed |
| US-20060179627-A1 | Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance | SHOWA DENKO K.K. | 2006-08-17 | — | — | US | disclosed |
| US-7087292-B2 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO K.K. (JP) | 2006-08-08 | — | — | US | disclosed |
| US-6790384-B2 | VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING | SHOWA DENKO K.K. (JP) | 2004-09-14 | — | — | US | disclosed |
| US-20040136145-A1 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO K.K. | 2004-07-15 | — | — | US | disclosed |
| US-6696138-B2 | POROUS VALVE ACTING METAL HAVING DIELECTRIC FILM | SHOWA DENKO K.K. (JP) | 2004-02-24 | — | — | US | disclosed |
| US-20030148023-A1 | Solid electrolytic capacitor and method for producing the same | SHOWA DENKO K.K. | 2003-08-07 | — | — | US | disclosed |
| US-6517892-B1 | Forming electroconductive film filling microfine pores and covering dielectric layer; oxidative solution polymerization; such as cationic polythiophene or polyfuran | SHOWA DENKO K.K. (JP) | 2003-02-11 | — | — | US | disclosed |
| US-20020039274-A1 | SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER | SHOWA DENKO K.K. | 2002-04-04 | — | — | US | disclosed |
| EP-1190426-A1 | SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR PRODUCING THE SAME | Showa Denko K K (JP) | 2002-03-27 | — | — | EP | disclosed |
| US-20020034060-A1 | VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING | SHOWA DENKO K.K. | 2002-03-21 | — | — | US | disclosed |
| WO-2000060620-A1 | SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR PRODUCING THE SAME | SHOWA DENKO K. K. (JP) | 2000-10-12 | — | — | WO | disclosed |
| EP-0971382-A1 | SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF | Showa Denko K K (JP) | 2000-01-12 | — | — | EP | disclosed |