SCHEMBL2860306

SCHEMBL2860306

CSc1c(N)ccc(C)c1N

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.41
CD44 P16070 1/20 0.41
ALDH1A1 P00352 5/20 0.36
CYP3A4 P08684 5/20 0.36
TDP1 Q9NUW8 4/20 0.36
TSHR P16473 2/20 0.36
CASP1 P29466 1/20 0.36
HSD17B10 Q99714 2/20 0.33
LMNA P02545 2/20 0.33
MAPT P10636 2/20 0.33
ALOX15 P16050 2/20 0.33
NOS3 P29474 1/20 0.33
NOS2 P35228 1/20 0.33
KDM4E B2RXH2 1/20 0.33
GAA P10253 1/20 0.33
HPGD P15428 1/20 0.33
PDE10A Q9Y233 1/20 0.33
ESR1 P03372 1/20 0.32
AR P10275 1/20 0.32
ESR2 Q92731 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26793771 0.85 POLB (0.44) POLBCD44ALDH1A1CYP3A4TDP1
SCHEMBL9781512 0.83 CYP3A4 (0.37) POLBCD44ALDH1A1CYP3A4TDP1
SCHEMBL3874821 0.81 CYP3A4 (0.36) POLBCD44ALDH1A1CYP3A4TDP1
SCHEMBL9578911 0.81 CD44 (0.41) POLBCD44ALDH1A1CYP3A4TDP1
SCHEMBL6855355 0.79 POLB (0.39) POLBCD44ALDH1A1CYP3A4TDP1
SCHEMBL21614311 0.77 CYP3A4 (0.40) POLBCD44ALDH1A1CYP3A4TSHR
SCHEMBL4910733 0.76 NPC1 (0.36) NPC1RAB9A
SCHEMBL9578929 0.76 ESR1 (0.37) POLBCD44ALDH1A1CYP3A4TDP1
SCHEMBL9180441 0.72 ALDH1A1 (0.46) POLBALDH1A1CYP3A4TDP1TSHR
SCHEMBL17843571 0.72 POLB (0.46) POLBCD44ALDH1A1CYP3A4TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112692725-B Composition for polishing pad and polishing pad SKC索密思株式会社 2023-05-16 CN claimed
CN-112692725-A Composition for polishing pad and polishing pad SKC索密思株式会社 2021-04-23 CN claimed
CN-107636039-B Curing agent for thermosetting epoxy resins and method for producing insulation systems for electronic engineering 亨斯迈先进材料许可(瑞士)有限公司 2020-11-24 CN claimed
CN-106103523-B Polymer dispersions with nanoscale polyurea particles dispersed in polyethers 陶氏环球技术有限责任公司 2020-03-10 CN claimed
EP-0586660-B1 2-SULPHURED METAPHENYLENEDIAMINES FOR DYEING HAIR OREAL (FR) 1997-01-29 EP claimed
WO-1993018739-A1 2-SULPHURED METAPHENYLENEDIAMINES FOR DYEING HAIR L'OREAL (FR) 1993-09-30 WO claimed
EP-0329821-A2 Polyhydroxyalkane/aromatic diamine chain extenders ETHYL CORPORATION (US) 1989-08-30 EP claimed
CN-114829237-B Method for manufacturing mudguard lining AGC株式会社 2024-06-28 CN disclosed
CN-117140344-A polishing pad 霓达杜邦股份有限公司 2023-12-01 CN disclosed
CN-116806229-A Novel curable composition containing cyclic monomer 株式会社德山 2023-09-26 CN disclosed
CN-116802774-A Hollow microsphere 株式会社德山 2023-09-22 CN disclosed
CN-116745336-A Curable composition comprising cyclic polyfunctional monomer 株式会社德山 2023-09-12 CN disclosed
CN-116745333-A Novel minute hollow particles formed of melamine resin 国立大学法人鹿儿岛大学 2023-09-12 CN disclosed
EP-0169101-B1 PROCESS FOR PREPARING (HYDROCARBYLTHIO)CYCLIC AMINES ETHYL CORPORATION (US) 1988-08-24 EP disclosed
US-4760188-A Substituted diaminotoluene ETHYL CORPORATION (US) 1988-07-26 US disclosed
US-4757119-A Diamine curing agent ETHYL CORPORATION (US) 1988-07-12 US disclosed
EP-0193872-A2 Di(alkylthio) diamine chain extenders for polyurethane elastomers ETHYL CORPORATION (US) 1986-09-10 EP disclosed
US-4595742-A Formed by reacting polyisocyanate, an organic active hydrogen group containing compound, and a chain extender comprising an aromatic diamine ETHYL CORPORATION (US) 1986-06-17 US disclosed
US-4594453-A Reacting hydrocarbyl disulfide with aromatic amine ETHYL CORPORATION (US) 1986-06-10 US disclosed
EP-0169101-A1 Process for preparing (hydrocarbylthio)cyclic amines ETHYL CORPORATION (US) 1986-01-22 EP disclosed