SCHEMBL28619210

SCHEMBL28619210

CCOc1ccccc1P=O

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.50
L3MBTL1 Q9Y468 6/20 0.48
MAPT P10636 3/20 0.48
NPSR1 Q6W5P4 1/20 0.48
GLA P06280 1/20 0.48
GAA P10253 2/20 0.47
HCRTR1 O43613 2/20 0.43
CYP2C19 P33261 2/20 0.42
KDM4E B2RXH2 1/20 0.42
KMT2A Q03164 1/20 0.42
CYP1A2 P05177 1/20 0.42
CYP2D6 P10635 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
MAPK1 P28482 1/20 0.41
POLB P06746 2/20 0.41
LMNA P02545 1/20 0.41
MCL1 Q07820 1/20 0.41
PTPRC P08575 1/20 0.40
ATM Q13315 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28033725 0.84 KMT2A (0.45) ALDH1A1L3MBTL1MAPTNPSR1GAA
SCHEMBL6716077 0.82 CYP1A2 (0.55) ALDH1A1L3MBTL1MAPTNPSR1GAA
SCHEMBL28257285 0.82 ALDH1A1 (0.41) ALDH1A1L3MBTL1MAPTNPSR1GLA
SCHEMBL6716078 0.82 CYP1A2 (0.55) ALDH1A1L3MBTL1MAPTNPSR1GAA
SCHEMBL28193796 0.80 LMNA (0.54) ALDH1A1MAPTNPSR1CYP2C19KMT2A
SCHEMBL28241443 0.80 LMNA (0.54) ALDH1A1MAPTNPSR1CYP2C19KMT2A
SCHEMBL7455640 0.78 MAPT (0.37) ALDH1A1L3MBTL1MAPTGAAKDM4E
1,2-Diethoxybenzene SCHEMBL29428929 0.77 ALDH1A1 (0.68) ALDH1A1L3MBTL1MAPTNPSR1GLA
1,2-Diethoxybenzene SCHEMBL578986 0.77 ALDH1A1 (0.68) ALDH1A1L3MBTL1MAPTNPSR1GLA
SCHEMBL6718450 0.76 CA1 (0.55) ALDH1A1L3MBTL1MAPTGAATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120152853-A Ink jet recording apparatus and ink jet recording method 富士胶片株式会社 2025-06-13 CN disclosed
CN-119404142-A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing semiconductor package substrate or printed wiring board 株式会社力森诺科 2025-02-07 CN disclosed
CN-119045281-A Photosensitive resin composition, photosensitive element, and method for producing wiring board 株式会社力森诺科 2024-11-29 CN disclosed
WO-2024009870-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING SEMICONDUCTOR PACKAGE OR RINTED WIRING BOARD 株式会社レゾナック 2024-01-11 WO disclosed
WO-2024009432-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING SEMICONDUCTOR PACKAGE SUBSTATE OR PRINTED WIRING BOARD 株式会社レゾナック 2024-01-11 WO disclosed
WO-2023238299-A1 ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD 株式会社レゾナック 2023-12-14 WO disclosed
WO-2023188926-A1 DOUBLE-SIDED ADHESIVE SHEET, MULTILAYER BODY FOR CONSTITUTING IMAGE DISPLAY DEVICE, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2023-10-05 WO disclosed
WO-2023136105-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, AND PRODUCTION METHOD OF LAMINATE 株式会社レゾナック 2023-07-20 WO disclosed
WO-2023058600-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, AND METHOD FOR PRODUCING LAYERED BODY 株式会社レゾナック 2023-04-13 WO disclosed
WO-2023012985-A1 PHOTOSENSITIVE FILM, PHOTOSENSITIVE ELEMENT, AND METHOD FOR PRODUCING MULTILAYER BODY 昭和電工マテリアルズ株式会社 2023-02-09 WO disclosed
WO-2022190208-A1 PHOTOSENSITIVE FILM, PHOTOSENSITIVE ELEMENT AND METHOD FOR PRODUCING MULTILAYER BODY 昭和電工マテリアルズ株式会社 2022-09-15 WO disclosed
WO-2022191125-A1 PHOTOSENSITIVE FILM, PHOTOSENSITIVE ELEMENT, AND PRODUCTION METHOD FOR LAYERED PRODUCT 昭和電工マテリアルズ株式会社 2022-09-15 WO disclosed
WO-2022180962-A1 ULTRAVIOLET CURABLE AQUEOUS INK COMPOSITION FOR INKJET PRINTING サカタインクス株式会社 2022-09-01 WO disclosed
WO-2022145180-A1 SOLID ELECTROLYTE, SOLID ELECTROLYTE MANUFACTURING METHOD, BATTERY, AND ARTICLE AGC株式会社 2022-07-07 WO disclosed
WO-2022130837-A1 SHOCK ABSORBING SHEET AGC株式会社 2022-06-23 WO disclosed
WO-2022113544-A1 ADHESIVE COMPOSITION FOR COATING-TYPE POLARIZATION ELEMENT, ADHESIVE SHEET FOR COATING-TYPE POLARIZATION ELEMENT, ADHESIVE SHEET FOR IMAGE DISPLAY DEVICE CONSTITUTING MEMBER, ADHESIVE SHEET WITH MOLD RELEASE FILM, ADHESIVE SHEET WITH IMAGE DISPLAY DEVICE CONSTITUTING MEMBER, LAMINATE SHEET, COATING-TYPE POLARIZATION ELEMENT WITH ADHESIVE LAYER, ADHESIVE SHEET WITH POLARIZATION ELEMENT, AND IMAGE DISPLAY DEVICE 三菱ケミカル株式会社 2022-06-02 WO disclosed
WO-2022113562-A1 LAMINATION FILM FOR LIQUID CRYSTAL POLARIZING MEMBRANE, SURFACE PROTECTION FILM FOR LIQUID CRYSTAL POLARIZING MEMBRANE, LAMINATE PROVIDED WITH LIQUID CRYSTAL POLARIZING MEMBRANE, AND IMAGE DISPLAY APPARATUS INCLUDING LIQUID CRYSTAL POLARIZING MEMBRANE 三菱ケミカル株式会社 2022-06-02 WO disclosed
WO-2022054387-A1 INKJET RECORDING INK AND INKJET RECORDING METHOD 富士フイルム株式会社 2022-03-17 WO disclosed
CN-110229188-B Preparation method of arylmethylphosphonic acid compound 苏州大学 2021-08-27 CN disclosed
CN-110770245-A Compound, photopolymerization initiator, photocurable composition, cured product thereof, photocurable ink, and printed matter using the same DIC株式会社 2020-02-07 CN disclosed