Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 8/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.39 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.37 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.37 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7131620 | 0.89 | DNM1 (0.35) | DNM1MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL17937603 | 0.89 | DNM1 (0.40) | DNM1MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL5833984 | 0.89 | ADRB2 (0.36) | ALDH1A1TSHRADRB2ADRB1ADRB3 | |
| SCHEMBL707072 | 0.89 | ADRB2 (0.36) | ALDH1A1TSHRADRB2ADRB1ADRB3 | |
| SCHEMBL703938 | 0.89 | ADRB2 (0.36) | ALDH1A1TSHRADRB2ADRB1ADRB3 | |
| SCHEMBL17937635 | 0.87 | DNM1 (0.39) | DNM1MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL707587 | 0.86 | ADRB2 (0.38) | ALDH1A1TSHRADRB2ADRB1ADRB3 | |
| SCHEMBL11766919 | 0.85 | CA12 (0.37) | MEN1KMT2AALDH1A1TSHRCA1 | |
| SCHEMBL11764635 | 0.85 | CA12 (0.40) | DNM1MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL5833540 | 0.84 | ADRB2 (0.36) | ALDH1A1TSHRADRB2ADRB1ADRB3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6040101-A | Carrier particles for use in electrostatic image development and electrostatic image developer | NIPPON SHOKUBAI CO., LTD. (JP) | 2000-03-21 | — | — | US | claimed |
| EP-3260515-A1 | POLISHING COMPOSITION | Fujimi Incorporated (JP) | 2017-12-27 | — | — | EP | disclosed |
| US-20160288289-A1 | POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2016-10-06 | — | — | US | disclosed |
| EP-3048152-A1 | POLISHING COMPOSITION | Fujimi Incorporated (JP) | 2016-07-27 | — | — | EP | disclosed |
| CN-105555901-A | Polishing composition | FUJIMI INC | 2016-05-04 | — | — | CN | disclosed |
| US-20140295109-A1 | FILM WITH TRANSPARENT ELECTROCONDUCTIVE MEMBRANE AND ITS USE | DAINIPPON PRINTING CO LTD (JP) | 2014-10-02 | — | — | US | disclosed |
| EP-2646880-A1 | TWO-COMPONENT DEVELOPER | Canon Kabushiki Kaisha (JP) | 2013-10-09 | — | — | EP | disclosed |
| US-20130244159-A1 | TWO-COMPONENT DEVELOPER | CANON KABUSHIKI KAISHA (JP) | 2013-09-19 | — | — | US | disclosed |
| CN-103261972-A | Two-component developer | CANON KK | 2013-08-21 | — | — | CN | disclosed |
| WO-2012074035-A1 | TWO-COMPONENT DEVELOPER | CANON KABUSHIKI KAISHA (JP) | 2012-06-07 | — | — | WO | disclosed |
| US-20060093758-A1 | Gas barrier film, and display substrate and display using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-05-04 | — | — | US | disclosed |
| US-20050236985-A1 | Flexible substrate and organic device using the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-10-27 | — | — | US | disclosed |
| EP-0798054-B1 | Process for producing a coated film continuously | NIPPON CATALYTIC CHEM IND (JP) | 2003-09-03 | — | — | EP | disclosed |
| EP-1325948-A1 | Process for producing a coated film continuously | NIPPON SHOKUBAI CO., LTD. (JP) | 2003-07-09 | — | — | EP | disclosed |
| EP-0671450-B1 | USE OF A SURFACE TREATMENT COMPOSITION FOR COATINGS REDUCING THE PERMEABILITY FOR GASES | NIPPON CATALYTIC CHEM IND (JP) | 2002-08-21 | — | — | EP | disclosed |
| US-6159546-A | Process of continuously coating an organometallic coating composition on a running substrate | NIPPON SHOKUBAI CO., LTD. (JP) | 2000-12-12 | — | — | US | disclosed |
| US-6040101-A | Carrier particles for use in electrostatic image development and electrostatic image developer | NIPPON SHOKUBAI CO., LTD. (JP) | 2000-03-21 | — | — | US | disclosed |
| US-5728770-A | COMPRISING A SILANE, ORGANOMETALLIC COMPOUMD, A COMPOUND WITH TWO FUNCTIONAL GROUPS AND A SOLVENT; EXCELLENT GAS BARRIER PROPERTIES | NIPPON SHOKUBAI CO., LTD. (JP) | 1998-03-17 | — | — | US | disclosed |
| EP-0798054-A2 | Process for producing a coated film continuously | NIPPON SHOKUBAI CO., LTD. (JP) | 1997-10-01 | — | — | EP | disclosed |
| EP-0671450-A1 | SURFACE TREATMENT COMPOSITION AND SURFACE-TREATED RESIN MOLDING | NIPPON SHOKUBAI CO., LTD. (JP) | 1995-09-13 | — | — | EP | disclosed |