SCHEMBL28619583

SCHEMBL28619583

CCC(C)CCC(CC)Cc1ccccc1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.42
HSPA5 P11021 1/20 0.39
POLB P06746 1/20 0.39
MAPK1 P28482 1/20 0.39
P4HB P07237 1/20 0.37
HTR1A P08908 1/20 0.37
CYP2D6 P10635 3/20 0.36
HIF1A Q16665 1/20 0.36
TAAR1 Q96RJ0 1/20 0.35
GABRA1 P14867 1/20 0.35
GABRB2 P47870 1/20 0.35
AKR1B1 P15121 1/20 0.35
CYP3A4 P08684 2/20 0.35
SLC6A2 P23975 2/20 0.35
SLC6A4 P31645 2/20 0.35
SLC6A3 Q01959 2/20 0.35
KCNH2 Q12809 2/20 0.35
LMNA P02545 1/20 0.35
IDO1 P14902 1/20 0.34
CA12 O43570 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14586738 0.84 HSPA5 (0.43) TSHRHSPA5POLBMAPK1HTR1A
SCHEMBL3959615 0.82 TSHR (0.50) TSHRHSPA5POLBMAPK1HTR1A
SCHEMBL23153080 0.82 TSHR (0.50) TSHRHSPA5POLBMAPK1HTR1A
SCHEMBL1310747 0.82 TSHR (0.41) TSHRHSPA5POLBMAPK1HTR1A
SCHEMBL105941 0.81 LMNA (0.51) TSHRHSPA5HTR1ACYP2D6HIF1A
SCHEMBL30763513 0.81 LMNA (0.51) TSHRHSPA5HTR1ACYP2D6HIF1A
SCHEMBL28293994 0.80 LMNA (0.50) TSHRHSPA5HTR1ACYP2D6HIF1A
SCHEMBL1311363 0.80 LMNA (0.44) TSHRHSPA5POLBMAPK1HTR1A
SCHEMBL2928610 0.79 TSHR (0.44) TSHRHSPA5POLBMAPK1HTR1A
SCHEMBL11582743 0.79 HTR1A (0.49) TSHRHSPA5POLBMAPK1HTR1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120118458-A Curable composition, resin, and cured product 东京应化工业株式会社 2025-06-10 CN disclosed
CN-119937242-A Photosensitive resin composition 东京应化工业株式会社 2025-05-06 CN disclosed
CN-113337170-B Curable composition, cured product, near infrared absorbing filter, and method for producing same 东京应化工业株式会社 2024-04-05 CN disclosed
CN-117327362-A Curable resin composition 东京应化工业株式会社 2024-01-02 CN disclosed
CN-117215149-A Photosensitive resin composition 东京应化工业株式会社 2023-12-12 CN disclosed
CN-113337170-A Curable composition, cured product, near-infrared absorption filter, and method for producing same 东京应化工业株式会社 2021-09-03 CN disclosed