SCHEMBL2862284

SCHEMBL2862284

CCCCCCCCC=CCCCCCCCC(=O)ON(CC)CC

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TERT O14746 3/20 0.56
PTPN1 P18031 3/20 0.56
PPARG P37231 3/20 0.56
PPARD Q03181 3/20 0.56
PPARA Q07869 3/20 0.56
CYP1A2 P05177 2/20 0.56
MAPT P10636 2/20 0.56
CYP2C19 P33261 2/20 0.56
BLM P54132 2/20 0.56
HSD17B10 Q99714 2/20 0.56
FABP4 P15090 2/20 0.56
FAAH O00519 2/20 0.56
KMT2A Q03164 2/20 0.56
GMNN O75496 1/20 0.56
USP2 O75604 1/20 0.56
LMNA P02545 1/20 0.56
POLB P06746 1/20 0.56
CYP2C9 P11712 1/20 0.56
ALOX15 P16050 1/20 0.56
APEX1 P27695 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL35641 1.00 TERT (0.56) TERTPTPN1PPARGPPARDPPARA
SCHEMBL28481474 0.89 DGKA (0.55) PTPN1PPARGPPARDPPARAMAPT
SCHEMBL28288861 0.89 DGKA (0.55) PTPN1PPARGPPARDPPARAMAPT
SCHEMBL10533988 0.89 DGKA (0.55) PTPN1PPARGPPARDPPARAMAPT
SCHEMBL28290205 0.89 DGKA (0.55) PTPN1PPARGPPARDPPARAMAPT
SCHEMBL27499918 0.89 DGKA (0.55) PTPN1PPARGPPARDPPARAMAPT
SCHEMBL557516 0.89 DGKA (0.55) PTPN1PPARGPPARDPPARAMAPT
SCHEMBL10578865 0.89 CNR2 (0.56) TERTPTPN1PPARGPPARDPPARA
SCHEMBL6448523 0.89 TERT (0.54) TERTPTPN1PPARGPPARDPPARA
SCHEMBL11055196 0.88 DGKA (0.52) PTPN1PPARGPPARDPPARAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7749599-B2 Cushioning material for a polishing pad NHK SPRING CO., LTD. (JP) 2010-07-06 US disclosed
US-20090011221-A1 Cushioning Material for a Polishing Pad TOYO QUALITY ONE CORPORATION (JP) 2009-01-08 US disclosed
US-4282329-A REACTING WITH POLYISOCYANATE TO FORM CELLULAR POLYURETHANE PLASTICS BAYER AKTIENGESELLSCHAFT (DE) 1981-08-04 US disclosed
US-4240950-A REACTING A SUSPENSION OF AN INORGANIC FILLER IN A POLYOL WITH A POLYISOCYANATE TO PRODUCE A POLYURETHANE BAYER AKTIENGESELLSCHAFT (DE) 1980-12-23 US disclosed