⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL617987 | 0.79 | — | — | |
| SCHEMBL11145031 | 0.79 | FOLH1 (0.53) | — | |
| SCHEMBL6976689 | 0.73 | — | — | |
| SCHEMBL1402745 | 0.73 | — | — | |
| SCHEMBL37529 | 0.73 | — | — | |
| SCHEMBL564158 | 0.73 | — | — | |
| SCHEMBL6976688 | 0.71 | — | — | |
| SCHEMBL15779976 | 0.71 | — | — | |
| Hydrochloric Acid SCHEMBL7707629 | 0.71 | — | — | |
| SCHEMBL8499764 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113227010-A | Hydrofluoric acid-resistant resist composition and substrate processed product obtained using same | 太阳油墨制造株式会社 | 2021-08-06 | — | — | CN | disclosed |