⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2188738 | 0.89 | — | — | |
| SCHEMBL2189741 | 0.87 | — | — | |
| SCHEMBL30971710 | 0.87 | — | — | |
| SCHEMBL13109254 | 0.85 | — | — | |
| SCHEMBL2323149 | 0.82 | PKM (0.30) | — | |
| SCHEMBL2189050 | 0.82 | LMNA (0.32) | — | |
| SCHEMBL2193017 | 0.80 | — | — | |
| SCHEMBL4442983 | 0.78 | — | — | |
| SCHEMBL2001702 | 0.75 | — | — | |
| SCHEMBL1199716 | 0.75 | GRIN2D (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5017734-A | Ethynyl adamantane derivatives and methods of polymerization thereof | FLUOROCHEM INC., A CORP. OF CALIFORNIA | 1991-05-21 | — | — | US | claimed |
| EP-1752476-B1 | Insulating film formed by using a film-forming composition comprising a polymer and electronic device | FUJIFILM CORP (JP) | 2012-12-12 | — | — | EP | disclosed |
| US-7750102-B2 | Insulating film for semiconductor integrated circuit | FUJIFILM CORPORATION (JP) | 2010-07-06 | — | — | US | disclosed |
| US-7612155-B2 | Film forming composition, insulating film formed by use of the composition, and electronic device | FUJIFILM CORPORATION (JP) | 2009-11-03 | — | — | US | disclosed |
| US-20090221779-A1 | FILM FORMING COMPOSITION, INSULATING FILM, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2009-09-03 | — | — | US | disclosed |
| US-7514513-B2 | Polymer, film-forming composition comprising the polymer, insulating film formed by using the composition and electronic device | FUJIFILM CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20090048421-A1 | FILM FORMING COMPOSITION, FILM, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2009-02-19 | — | — | US | disclosed |
| US-20080251892-A1 | INSULATING FILM FOR SEMICONDUCTOR INTEGRATED CIRCUIT | FUJIFILM CORPORATION (JP) | 2008-10-16 | — | — | US | disclosed |
| US-20070255003-A1 | Film forming composition, insulating film formed by use of the composition, and electronic device | FUJIFILM CORPORATION (JP) | 2007-11-01 | — | — | US | disclosed |
| EP-1772469-A2 | Polymer and film forming composition | FUJIFILM Corporation (JP) | 2007-04-11 | — | — | EP | disclosed |
| US-20070073020-A1 | Polymer and film forming composition | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |
| US-20070037941-A1 | Polymer formed by polymerizing a mono- or dialkynylbiadamantane in the presence of a free radical catalyst; polymer can be dissolved in cyclohexanone to a concentration of 1 mass % or more at 25 degrees C. and formed into dielectric thin films | FUJI PHOTO FILM CO., LTD. | 2007-02-15 | — | — | US | disclosed |
| EP-1752476-A1 | Polymer, film-forming composition comprising the polymer, insulating film formed by using the composition and electronic device | Fuji Photo Film Co., Ltd. (JP) | 2007-02-14 | — | — | EP | disclosed |
| US-5017734-A | Ethynyl adamantane derivatives and methods of polymerization thereof | FLUOROCHEM INC., A CORP. OF CALIFORNIA | 1991-05-21 | — | — | US | disclosed |
| US-5017734-A | Ethynyl adamantane derivatives and methods of polymerization thereof | FLUOROCHEM INC., A CORP. OF CALIFORNIA | 1991-05-21 | — | — | US | disclosed |