SCHEMBL28633009

SCHEMBL28633009

CC(CCCOCC1CO1)CO[SiH3]

nearest known ligand 0.53

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.53
SMN1; SMN2 Q16637 1/20 0.51
ALDH1A1 P00352 4/20 0.49
TDP1 Q9NUW8 1/20 0.49
MAPK1 P28482 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1402713 0.88 TSHR (0.59) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL614219 0.83 TSHR (0.57) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL1402365 0.83 TSHR (0.62) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL21795698 0.82 TSHR (0.60) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL27521802 0.81 SMN1; SMN2 (0.61) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL2431711 0.80 TSHR (0.57) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL13367691 0.80 TSHR (0.57) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL10754352 0.80 TSHR (0.67) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL29156594 0.80 TSHR (0.61) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1
SCHEMBL10585663 0.79 TSHR (0.65) TSHRSMN1; SMN2ALDH1A1TDP1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115785592-A Secondary surface mirror based on surface modified fluoroplastic film and preparation method and application thereof 中国科学院上海硅酸盐研究所 2023-03-14 CN disclosed
CN-115746368-A Polymer surface anti-atomic oxygen/ultraviolet-intercepting modified film layer and preparation method and application thereof 中国科学院上海硅酸盐研究所 2023-03-07 CN disclosed
CN-113831676-A Antistatic resin composition, method for producing antistatic resin composition, and electronic component packaging material 旭化成株式会社 2021-12-24 CN disclosed
CN-113348207-A Block copolymer composition, molded article, method for producing molded article, and method for adjusting haze value of molded article 旭化成株式会社 2021-09-03 CN disclosed