Hydrochloric Acid

SCHEMBL2863639

CC1=C(C)C(C)C([Zr+2](=C(c2ccc(C)cc2)c2ccc(C)cc2)C2c3cc(C(C)(C)C)c(C(C)(C)C)cc3-c3cc(C(C)(C)C)c(C(C)(C)C)cc32)=C1C.[Cl-].[Cl-]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHE BDKRB2 CHRM1 CHRM2 CHRM3 CHRNA1 CHRNB1 CHRND CHRNE CHRNG GUCY1A1 GUCY1A2 GUCY1B1 GUCY1B2 NAMPT PTAFR SLC10A2 SLC6A2 SLC6A3 TACR1 dacA dacB dacC ftsI mrcA mrcB mrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compound	similarity	top predicted	shared targets
Hydrochloric Acid SCHEMBL2859891	0.93	—	—
Hydrochloric Acid SCHEMBL2856402	0.89	—	—
Hydrochloric Acid SCHEMBL2862373	0.85	NPC1 (0.32)	—
Hydrochloric Acid SCHEMBL2860374	0.85	NPC1 (0.32)	—
Hydrochloric Acid SCHEMBL455031	0.80	TSHR (0.31)	—
Hydrochloric Acid SCHEMBL452360	0.79	LMNA (0.31)	—
Hydrochloric Acid SCHEMBL2866553	0.75	—	—
Hydrochloric Acid SCHEMBL450476	0.74	—	—
Hydrochloric Acid SCHEMBL2862196	0.74	—	—
Hydrochloric Acid SCHEMBL2865439	0.73	—	—

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

Patent	Title	Assignee	Published	Priority	Filing	Country	Status
EP-1661921-B1	Synthetic lubricating oil and lubricating oil composition thereof	MITSUI CHEMICALS INC (JP)	2019-07-17	—	—	EP	disclosed
US-7795194-B2	Synthetic lubricating oil and lubricating oil composition	MITSUI CHEMICALS, INC. (JP)	2010-09-14	—	—	US	disclosed
US-20060116303-A1	decene-ethylene copolymer, zirconium, titanium or hafnium fluorene-containing complexes, organometallics; improved high thermal oxidation stability, viscosity index, low-temperature viscosity properties and shear stability	MITSUI CHEMICALS, INC. (JP)	2006-06-01	—	—	US	disclosed