SCHEMBL2863654

SCHEMBL2863654

CCN(CC)C1N(C)CCC(C)N1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2956650 0.79
SCHEMBL2863904 0.78
SCHEMBL2860916 0.77
SCHEMBL2947849 0.75
Hydrochloric Acid SCHEMBL3283252 0.73
SCHEMBL2865685 0.72
SCHEMBL1901910 0.68
SCHEMBL2867904 0.68
Phosphoric Acid SCHEMBL5096408 0.67 FDPS (0.32)
SCHEMBL13663738 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12466956-B2 Electroconductive resin composition and molded article of same DENKA COMPANY LIMITED (JP) 2025-11-11 US disclosed
WO-2023189133-A1 CONDUCTIVE RESIN COMPOSITION デンカ株式会社 2023-10-05 WO disclosed
US-20220392373-A1 MUCOSAL TISSUE MODEL DENKA COMPANY LIMITED (JP) 2022-12-08 US disclosed
EP-4083969-A1 MUCOSAL TISSUE MODEL Denka Company Limited (JP) 2022-11-02 EP disclosed
EP-3845600-B1 ELECTROCONDUCTIVE RESIN COMPOSITION AND MOLDED ARTICLE OF SAME DENKA COMPANY LTD (JP) 2022-10-26 EP disclosed
US-20210246314-A1 ELECTROCONDUCTIVE RESIN COMPOSITION AND MOLDED ARTICLE OF SAME DENKA COMPANY LIMITED (JP) 2021-08-12 US disclosed
EP-3845600-A1 ELECTROCONDUCTIVE RESIN COMPOSITION AND MOLDED ARTICLE OF SAME Denka Company Limited (JP) 2021-07-07 EP disclosed
US-20100321863-A1 ACTIVATED CARBON AND PROCESS FOR PRODUCING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-12-23 US disclosed
US-7800886-B2 Electric double layer capacitor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-09-21 US disclosed
US-7785495-B2 Activated carbon prepared by carbonizing and activating a calixarene containing dihydroxybenzene rings; especially calcining at 400 degrees C. or less in the presence of an oxidative gas, calcining at 1500 degrees or less in an inactive gas, and then further calcining at 200-1500 degrees in H2O or CO2 SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-08-31 US disclosed
US-7470738-B2 Non-aqueous absorbent and use thereof SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2008-12-30 US disclosed
US-20080233438-A1 Fuel for fuel cell, fuel cell and application thereof KURITA WATER INDUSTRIES LTD. (JP) 2008-09-25 US disclosed
US-20080094777-A1 Electric double layer capacitor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-04-24 US disclosed
EP-1905740-A1 ELECTRIC DOUBLE LAYER CAPACITOR Sumitomo Chemical Company, Limited (JP) 2008-04-02 EP disclosed
US-20070269987-A1 Polishing Liquid for Cmp Process and Polishing Method SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2007-11-22 US disclosed
CN-1894818-A Fuel for fuel cell, fuel cell and use thereof KURITA WATER IND LTD (JP) 2007-01-10 CN disclosed
EP-1705740-A1 FUEL FOR FUEL CELL, FUEL CELL AND APPLICATION THEREOF Kurita Water Industries Ltd. (JP) 2006-09-27 EP disclosed
EP-1628334-A1 POLISHING LIQUID FOR CMP PROCESS AND POLISHING METHOD SANYO CHEMICAL INDUSTRIES LTD. (JP) 2006-02-22 EP disclosed
US-20050136247-A1 Non-aqueous absorbent and use thereof SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2005-06-23 US disclosed
EP-1462460-A1 NON-AQUEOUS ABSORBENT AND USE THEREOF SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2004-09-29 EP disclosed