⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4591696 | 0.66 | GSK3A (0.43) | — | |
| SCHEMBL15069798 | 0.58 | — | — | |
| SCHEMBL9187945 | 0.56 | TRPA1 (0.36) | — | |
| SCHEMBL708902 | 0.53 | — | — | |
| SCHEMBL10073942 | 0.53 | GSK3B (0.35) | — | |
| SCHEMBL17654017 | 0.50 | — | — | |
| SCHEMBL1649991 | 0.50 | GSK3B (0.32) | — | |
| SCHEMBL1649993 | 0.50 | GSK3B (0.32) | — | |
| Dimethylamine SCHEMBL2941937 | 0.50 | — | — | |
| SCHEMBL5416241 | 0.48 | GSK3B (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112920315-B | pH sensing fluorescent polymer and preparation method and application thereof | 五邑大学 | 2022-11-15 | — | — | CN | claimed |
| CN-114008537-B | Stripping composition for removing photoresist from semiconductor substrate | 富士胶片电子材料美国有限公司 | 2025-04-25 | — | — | CN | disclosed |
| CN-114008537-A | Stripping composition for removing photoresist from semiconductor substrate | 富士胶片电子材料美国有限公司 | 2022-02-01 | — | — | CN | disclosed |
| CN-109195720-B | Stripping composition for removing photoresist from semiconductor substrate | 富士胶片电子材料美国有限公司 | 2021-10-29 | — | — | CN | disclosed |