SCHEMBL2865089

SCHEMBL2865089

COc1cc(C(c2ccc(O)c(C)c2)c2ccc(O)c(C)c2)ccc1O

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.56
CYP3A4 P08684 1/20 0.56
GAA P10253 2/20 0.55
BLM P54132 2/20 0.54
NFKB1 P19838 1/20 0.54
NPSR1 Q6W5P4 1/20 0.54
PMP22 Q01453 1/20 0.53
MAOB P27338 1/20 0.50
BCHE P06276 2/20 0.49
TYR P14679 2/20 0.49
ACHE P22303 2/20 0.49
SLC22A3 O75751 1/20 0.49
CYP19A1 P11511 1/20 0.47
NQO1 P15559 1/20 0.46
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46
FOS P01100 1/20 0.45
TTR P02766 1/20 0.45
JUN P05412 1/20 0.45
NR3C1 P04150 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30826323 1.00 TSHR (0.56) TSHRCYP3A4GAABLMNFKB1
SCHEMBL20563424 0.91 TSHR (0.65) TSHRCYP3A4GAABLMNFKB1
SCHEMBL29695982 0.90 TSHR (0.53) TSHRCYP3A4GAABLMNFKB1
SCHEMBL2203108 0.90 TSHR (0.53) TSHRCYP3A4GAABLMNFKB1
SCHEMBL1596291 0.89 TSHR (0.62) TSHRCYP3A4GAABLMNFKB1
SCHEMBL19728205 0.88 TSHR (0.58) TSHRCYP3A4GAABLMNFKB1
SCHEMBL22452310 0.88 GAA (0.48) TSHRCYP3A4GAABLMNFKB1
SCHEMBL31516847 0.85 TSHR (0.59) TSHRCYP3A4GAABLMNFKB1
SCHEMBL29465801 0.84 TP53 (0.54) CYP3A4GAANPSR1HSD17B1HSD17B2
SCHEMBL674987 0.84 TP53 (0.54) CYP3A4GAANPSR1HSD17B1HSD17B2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117756612-A Synthesis method of 4- [ bis (4-hydroxy-3-methylphenyl) methyl ] -2-methoxyphenol 沈阳思拓新材料技术有限公司 2024-03-26 CN claimed
CN-117756612-A Synthesis method of 4- [ bis (4-hydroxy-3-methylphenyl) methyl ] -2-methoxyphenol 沈阳思拓新材料技术有限公司 2024-03-26 CN disclosed
CN-117756612-A Synthesis method of 4- [ bis (4-hydroxy-3-methylphenyl) methyl ] -2-methoxyphenol 沈阳思拓新材料技术有限公司 2024-03-26 CN disclosed
CN-117756612-A Synthesis method of 4- [ bis (4-hydroxy-3-methylphenyl) methyl ] -2-methoxyphenol 沈阳思拓新材料技术有限公司 2024-03-26 CN disclosed
US-20210139390-A1 PRODUCTION METHOD OF ORGANIC COMPOUND UNITIKA LTD. (JP) 2021-05-13 US disclosed
EP-3819283-A1 METHOD FOR PRODUCING ORGANIC COMPOUND Unitika Ltd. (JP) 2021-05-12 EP disclosed
CN-112384489-A Method for producing organic compound 尤尼吉可株式会社 2021-02-19 CN disclosed
WO-2020009016-A1 METHOD FOR PRODUCING ORGANIC COMPOUND ユニチカ株式会社 2020-01-09 WO disclosed
US-20150228994-A1 POLYELECTROLYTE FILM KURARAY CO., LTD. (JP) 2015-08-13 US disclosed
EP-2889940-A1 POLYELECTROLYTE FILM Kuraray Co., Ltd. (JP) 2015-07-01 EP disclosed
EP-1640405-A1 RESIN AND ARTICLE MOLDED THEREFROM TORAY INDUSTRIES, INC. (JP) 2006-03-29 EP disclosed
US-20060047104-A1 Resin, resin composition, process for production thereof, and moldings made by using the same TORAY INDUSTRIES, INC. (JP) 2006-03-02 US disclosed
EP-1619735-A1 POLYMER ELECTROLYTE MATERIAL, POLYMER ELECTROLYTE PART, MEMBRANE ELECTRODE COMPOSITE AND POLYMER ELECTROLYTE TYPE FUEL CELL TORAY INDUSTRIES, INC. (JP) 2006-01-25 EP disclosed
EP-1518884-A1 RESIN, RESIN COMPOSITIONS, PROCESS FOR PRODUCTION THEREOF, AND MOLDINGS MADE BY USING THE SAME TORAY INDUSTRIES, INC. (JP) 2005-03-30 EP disclosed
US-6750313-B2 HIGH REFRACTIVE INDEX AND LOW DISPERSION CHARACTERISTICS; OPTICAL LENSES, FILMS, DISCS; POLYCARBONATE RESIN CONTAINING A PHOSPHONIC ACID GROUP TORAY INDUSTRIES, INC. (JP) 2004-06-15 US disclosed
EP-1375463-A1 OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Kansai Research Institute, Inc. (JP) 2004-01-02 EP disclosed
US-20030211421-A1 Optically active compound and photosensitive resin composition KRI, INC. (JP) 2003-11-13 US disclosed
US-20030013836-A1 Resin composition and articles molded therefrom TORAY INDUSTRIES, INC., A CORPORATION OF JAPAN (JP) 2003-01-16 US disclosed
EP-1270646-A1 RESIN COMPOSITION AND ARTICLES MOLDED THEREFROM TORAY INDUSTRIES, INC. (JP) 2003-01-02 EP disclosed
EP-0943640-A1 HIGHLY HEAT-RESISTANT, HIGH-PURITY POLYARYLATE AND FILM PRODUCED FROM THE SAME UNITIKA LTD. (JP) 1999-09-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030211421-A1 Optically active compound and photosensitive resin composition ARCN1, RAD51, PAM TSHR 4402/4885CYP3A4 2999/4885GAA 3627/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.