Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FABP3 | P05413 | 1/20 | 0.37 |
| ▸ | FABP4 | P15090 | 1/20 | 0.37 |
| ▸ | FABP5 | Q01469 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | APEX1 | P27695 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28267313 | 0.87 | FABP3 (0.33) | FABP3FABP4FABP5KDM4EPOLB | |
| Ammonia Solution, Strong SCHEMBL27469175 | 0.85 | FABP3 (0.32) | FABP3FABP4FABP5KDM4EPOLB | |
| SCHEMBL2866577 | 0.82 | FABP3 (0.42) | FABP3FABP4FABP5SMN1; SMN2LMNA | |
| SCHEMBL2521849 | 0.82 | CYP2D6 (0.35) | TSHRSMN1; SMN2KDM4EPOLBAPEX1 | |
| SCHEMBL5017182 | 0.80 | FABP3 (0.41) | FABP3FABP4FABP5SMN1; SMN2LMNA | |
| Formaldehyde SCHEMBL19137779 | 0.79 | SLC2A1 (0.33) | TSHRSMN1; SMN2KDM4EPOLBAPEX1 | |
| SCHEMBL19709581 | 0.77 | GABRA1 (0.31) | — | |
| SCHEMBL2521780 | 0.77 | CYP2D6 (0.35) | TSHRSMN1; SMN2KDM4EPOLBAPEX1 | |
| Ammonia Solution, Strong SCHEMBL27519326 | 0.77 | FABP3 (0.35) | FABP3FABP4FABP5 | |
| Ammonia Solution, Strong SCHEMBL28018848 | 0.76 | HTT (0.35) | SMN1; SMN2HPGDHSD17B10KDM4ECA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103503121-B | Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method for manufacturing same, and solar cell element and method for manufacturing same | 日立化成株式会社 | 2017-04-12 | — | — | CN | disclosed |
| US-9406834-B2 | Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method of producing the same, and photovoltaic cell element and method of producing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-20140242741-A1 | MATERIAL FOR FORMING PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE, PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE AND METHOD OF PRODUCING THE SAME, AND PHOTOVOLTAIC CELL ELEMENT AND METHOD OF PRODUCING THE SAME | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-08-28 | — | — | US | disclosed |
| US-8748877-B2 | Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method of producing the same, and photovoltaic cell element and method of producing the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2014-06-10 | — | — | US | disclosed |
| CN-103503121-A | Material for forming passivation film for semiconductor substrate, passivation film for semiconductor substrate and method for manufacturing same, and solar cell element and method for manufacturing same | HITACHI CHEMICAL CO LTD | 2014-01-08 | — | — | CN | disclosed |
| US-20120313199-A1 | MATERIAL FOR FORMING PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE, PASSIVATION FILM FOR SEMICONDUCTOR SUBSTRATE AND METHOD OF PRODUCING THE SAME, AND PHOTOVOLTAIC CELL ELEMENT AND METHOD OF PRODUCING THE SAME | HITACHI CHEMICAL COMPANY, LTD. | 2012-12-13 | — | — | US | disclosed |
| US-7754844-B2 | Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2010-07-13 | — | — | US | disclosed |
| EP-1561768-B1 | POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE | TOYO BOSEKI (JP) | 2009-09-30 | — | — | EP | disclosed |
| US-20080070086-A1 | Phase-Separated Polymer Electrolyte Membrane, Electrode - Phase-Separated Polymer Electrolyte Membrane Joint Using Same, Method for Manufacture Thereof, and Fuel Cell Using Same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2008-03-20 | — | — | US | disclosed |
| EP-1845573-A1 | PHASE SEPARATION TYPE POLYMER ELECTROLYTE FILM, ELECTRODE/PHASE SEPARATION TYPE POLYMER ELECTROLYTE FILM ASSEMBLY EMPLOYING THE SAME, PROCESSES FOR PRODUCING THE SAME, AND FUEL CELL EMPLOYING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 2007-10-17 | — | — | EP | disclosed |
| CN-1292015-C | Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those | TOYO BOSEKI (JP) | 2006-12-27 | — | — | CN | disclosed |
| US-20060166048-A1 | Polyarylene ether compound containing sulfonic acid group, composition containing same, and method for manufacturing those | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 2006-07-27 | — | — | US | disclosed |
| CN-1703443-A | Polyarylene ether compound containing sulfonic acid group, composition containing the same, and method for producing the same | TOYO BOSEKI (JP) | 2005-11-30 | — | — | CN | disclosed |
| EP-1561768-A1 | POLYARYLENE ETHER COMPOUND CONTAINING SULFONIC ACID GROUP, COMPOSITION CONTAINING SAME, AND METHOD FOR MANUFACTURING THOSE | Toyo Boseki Kabushiki Kaisha (JP) | 2005-08-10 | — | — | EP | disclosed |
| US-5596128-A | SULFONATION WITHOUT A CATALYST IN THE PRESENCE OF SOLVENT | KONISHI CHEMICAL IND. CO., LTD. (JP) | 1997-01-21 | — | — | US | disclosed |
| EP-0505582-B1 | SULFONATING AGENT AND PROCESS | KONISHI CHEM IND (JP) | 1996-07-31 | — | — | EP | disclosed |
| EP-0505582-A1 | SULFONATING AGENT AND PROCESS | KONISHI CHEMICAL IND. CO., LTD. (JP) | 1992-09-30 | — | — | EP | disclosed |