SCHEMBL2866535

SCHEMBL2866535

C=C(C)C(=O)Oc1c(OCC)cc(C2(c3cc(OCC)c(OC(=O)C(=C)C)c(OCC)c3OCC)c3ccccc3-c3ccccc32)c(OCC)c1OCC

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.36
MAPT P10636 2/20 0.35
TP53 P04637 1/20 0.35
GLA P06280 2/20 0.34
PDK2 Q15119 3/20 0.34
NPC1 O15118 1/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
KDM4E B2RXH2 1/20 0.33
ELANE P08246 1/20 0.33
ALDH1A1 P00352 3/20 0.32
HPGD P15428 2/20 0.32
TDP1 Q9NUW8 1/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
LMNA P02545 1/20 0.32
GAA P10253 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6324942 0.91 MAPT (0.38) TSHRMAPTTP53GLAPDK2
SCHEMBL6328897 0.90 TSHR (0.34) TSHRMAPTTP53GLAPDK2
SCHEMBL6323519 0.89 PDK2 (0.36) MAPTTP53PDK2NPC1ELANE
SCHEMBL6323480 0.88 TSHR (0.33) TSHRMAPTTP53GLAPDK2
SCHEMBL31068446 0.85 PDK2 (0.36) TSHRMAPTTP53GLAPDK2
SCHEMBL2873370 0.85 PDK2 (0.36) TSHRMAPTTP53GLAPDK2
SCHEMBL557052 0.84 TSHR (0.36) TSHRMAPTTP53GLAPDK2
SCHEMBL6330393 0.83 ELANE (0.35) MAPTGLAPDK2L3MBTL1KDM4E
SCHEMBL6324392 0.81 ELANE (0.32) PDK2KDM4EELANEALDH1A1SMN1; SMN2
SCHEMBL6324549 0.81 PDK2 (0.35) TP53PDK2KDM4EELANEALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10611869-B2 Curable composition and cured product AGC Inc. (JP) 2020-04-07 US disclosed
US-20190218325-A1 CURABLE COMPOSITION AND CURED PRODUCT AGC Inc. (JP) 2019-07-18 US disclosed
US-8431289-B2 Photosensitive composition for volume hologram recording, photosensitive medium for volume hologram recording and volume hologram DAI NIPPON PRINTING CO., LTD. (JP) 2013-04-30 US disclosed
US-7824822-B2 Photosensitive compositions for volume hologram recording, photosensitive medium for volume hologram recording and volume hologram DAI NIPPON PRINTING CO., LTD. (JP) 2010-11-02 US disclosed
US-20100266936-A1 PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING, PHOTOSENSITIVE MEDIUM FOR VOLUME HOLOGRAM RECORDING AND VOLUME HOLOGRAM DAI NIPPON PRINTING CO., LTD. (JP) 2010-10-21 US disclosed
US-20070148556-A1 Photosensitive composition for volume hologram recording DAI NIPPON PRINTING CO., LTD. (JP) 2007-06-28 US disclosed
US-20050185232-A1 Volume hologram recording photosensitive composition and its use NIPPON PAINT CO., LTD. (JP) 2005-08-25 US disclosed
US-20040137334-A1 Volume hologram recording photosensitive composition, volume hologram recording photosensitive medium and volume hologram DAI NIPPON PRINTING CO., LTD. (JP) 2004-07-15 US disclosed
US-20030096172-A1 Hologram recording material composition and hologram recording medium DAISO CO., LTD. (JP) 2003-05-22 US disclosed