SCHEMBL28666290

SCHEMBL28666290

C=C(C#N)C(=O)OCC1CCCCC1

nearest known ligand 0.50

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 2/20 0.50
▸ TSHR P16473 2/20 0.50
▸ LMNA P02545 1/20 0.45
▸ CTSK P43235 6/20 0.38
▸ CTSL P07711 2/20 0.38
▸ CTSB P07858 2/20 0.38
▸ SLC1A3 P43003 3/20 0.35
▸ SLC1A2 P43004 3/20 0.35
▸ SLC1A1 P43005 3/20 0.35
▸ HPGD P15428 1/20 0.34
▸ PARP15 Q460N3 1/20 0.33
▸ PARP10 Q53GL7 1/20 0.33
▸ XDH P47989 1/20 0.32
▸ NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8408212 0.77 ALDH1A1 (0.55) ALDH1A1TSHRLMNASLC1A3SLC1A2
SCHEMBL9008959 0.77 LMNA (0.49) ALDH1A1LMNASLC1A3SLC1A2SLC1A1
SCHEMBL15608263 0.77 ALDH1A1 (0.55) ALDH1A1TSHRLMNASLC1A3SLC1A2
SCHEMBL105131 0.77 ALDH1A1 (0.55) ALDH1A1TSHRLMNASLC1A3SLC1A2
SCHEMBL6081993 0.77 ALDH1A1 (0.55) ALDH1A1TSHRLMNASLC1A3SLC1A2
SCHEMBL23493948 0.77 ALDH1A1 (0.55) ALDH1A1TSHRLMNASLC1A3SLC1A2
SCHEMBL5936685 0.77 ALDH1A1 (0.55) ALDH1A1TSHRLMNASLC1A3SLC1A2
SCHEMBL1832544 0.77 ALDH1A1 (0.55) ALDH1A1TSHRLMNASLC1A3SLC1A2
SCHEMBL17146861 0.76 ALDH1A1 (0.44) ALDH1A1TSHR
SCHEMBL2932943 0.74 LMNA (0.53) ALDH1A1TSHRLMNANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250129391-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 — — US disclosed
WO-2025085828-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 — — WO disclosed
CN-113874459-A Flexible photocurable cyanoacrylate compositions 汉高知识产权控股有限责任公司 2021-12-31 — — CN disclosed
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