SCHEMBL2867531

SCHEMBL2867531

C#CC(F)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL144415 0.70
SCHEMBL5769027 0.70
SCHEMBL163947 0.70
SCHEMBL25244553 0.67
Hydrochloric Acid SCHEMBL20637765 0.67
SCHEMBL20638603 0.67
SCHEMBL2864416 0.65
SCHEMBL18992987 0.65
SCHEMBL648870 0.65
SCHEMBL11636736 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024207638-A1 METHOD FOR PREPARING HYDROFLUOROCARBONS AND METHOD FOR PREPARING FLUORINE-CONTAINING ALKYNES 泉州宇极新材料科技有限公司 2024-10-10 WO disclosed
US-8535551-B2 Plasma etching method ZEON CORPORATION (JP) 2013-09-17 US disclosed
US-8119037-B2 Square planar transition metal complexes and organic semiconductive materials using them as well as electronic or optoelectric components NOVALED AG (DE) 2012-02-21 US disclosed
US-20100264116-A1 PLASMA ETCHING METHOD ZEON CORPORATION (JP) 2010-10-21 US disclosed
EP-2194569-A1 PLASMA ETCHING METHOD ZEON CORPORATION (JP) 2010-06-09 EP disclosed
US-20100096600-A1 Square Planar Transition Metal Complexes and Organic Semiconductive Materials Using Them as Well as Electronic or Optoelectric Components NOVALED AG (DE) 2010-04-22 US disclosed