SCHEMBL2864416

SCHEMBL2864416

C#CC(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5188413 0.90 LMNA (0.33)
SCHEMBL31135124 0.87 LMNA (0.38)
SCHEMBL6358197 0.87 LMNA (0.38)
SCHEMBL10826755 0.87 LMNA (0.38)
SCHEMBL672488 0.87 LMNA (0.38)
SCHEMBL10826113 0.81
SCHEMBL10826142 0.81
SCHEMBL10826125 0.81
Ethyne SCHEMBL10826121 0.79
SCHEMBL163947 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024207638-A1 METHOD FOR PREPARING HYDROFLUOROCARBONS AND METHOD FOR PREPARING FLUORINE-CONTAINING ALKYNES 泉州宇极新材料科技有限公司 2024-10-10 WO disclosed
US-8535551-B2 Plasma etching method ZEON CORPORATION (JP) 2013-09-17 US disclosed
US-20100264116-A1 PLASMA ETCHING METHOD ZEON CORPORATION (JP) 2010-10-21 US disclosed
EP-2194569-A1 PLASMA ETCHING METHOD ZEON CORPORATION (JP) 2010-06-09 EP disclosed