Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.64 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.55 |
| ▸ | TSHR | P16473 | 2/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.54 |
| ▸ | MGLL | Q99685 | 1/20 | 0.51 |
| ▸ | TRPM8 | Q7Z2W7 | 2/20 | 0.49 |
| ▸ | NPC1 | O15118 | 2/20 | 0.49 |
| ▸ | TSPO | P30536 | 1/20 | 0.49 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.49 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.47 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.47 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | GAA | P10253 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL295841 | 0.91 | LMNA (0.53) | LMNAALDH1A1TSHRMGLLNPC1 | |
| SCHEMBL1373021 | 0.86 | MEN1 (0.53) | LMNAALDH1A1TSHRMGLLL3MBTL1 | |
| SCHEMBL10704105 | 0.84 | TDP1 (0.47) | LMNAALDH1A1TSHRMGLLTDP1 | |
| SCHEMBL30785329 | 0.84 | HDAC6 (0.51) | LMNAALDH1A1L3MBTL1HDAC1HDAC6 | |
| SCHEMBL7317141 | 0.83 | USP2 (0.54) | LMNAALDH1A1TSHRMAPK1HSD17B10 | |
| SCHEMBL31657256 | 0.83 | CNR2 (0.54) | LMNAHDAC1HDAC6 | |
| SCHEMBL27928642 | 0.83 | TDP1 (0.46) | LMNAALDH1A1TSHRMGLLTDP1 | |
| SCHEMBL31518843 | 0.82 | ALDH1A1 (0.48) | LMNAALDH1A1HSD17B10HDAC1HDAC6 | |
| SCHEMBL12863501 | 0.82 | LMNA (0.46) | LMNAALDH1A1TSHRMAPK1NPC1 | |
| SCHEMBL14448173 | 0.82 | LMNA (0.46) | LMNAALDH1A1TSHRMAPK1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 516 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7504446-B2 | Aqueous inks containing colored polymers | XEROX CORPORATION (US) | 2009-03-17 | — | — | US | claimed |
| US-20060074142-A1 | Aqueous inks containing colored polymers | XEROX CORPORATION | 2006-04-06 | — | — | US | claimed |
| US-6423458-B1 | — | — | None | — | — | US | disclosed |
| WO-2025045206-A1 | PYRUVIC ACID (HETERO)ARYL THIOESTER COMPOUNDS FOR LED PHOTOPOLYMERIZATION, PREPARATION THEREFOR AND USE THEREOF | 湖北固润科技股份有限公司 | 2025-03-06 | — | — | WO | disclosed |
| CN-112154149-B | New vinylphosphines and photoinitiators obtainable therefrom | 汉斯约尔格·格吕茨马赫 | 2025-02-21 | — | — | CN | disclosed |
| CN-119372671-A | Method for synthesizing amino acid compound by participation of carbon dioxide | 新疆大学 | 2025-01-28 | — | — | CN | disclosed |
| WO-2024157904-A1 | ORGANIC RESIN COMPOSITION FOR FORMING METAL OXIDE RESIST PATTERN | 日産化学株式会社 | 2024-08-02 | — | — | WO | disclosed |
| CN-115504896-B | Acrylic formate compound for LED photopolymerization, preparation method and application thereof | 湖北固润科技股份有限公司 | 2024-05-07 | — | — | CN | disclosed |
| WO-2024078413-A1 | ACRYLOYL FORMATE COMPOUND FOR LED PHOTOPOLYMERIZATION, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 湖北固润科技股份有限公司 | 2024-04-18 | — | — | WO | disclosed |
| CN-117142995-A | Pyruvic acid (hetero) arylthioester compound for LED photopolymerization and preparation and application thereof | 湖北固润科技股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| CN-117142994-A | Amphiphilic polyether alpha-ketone (hetero) arylthioester compound for LED photopolymerization and preparation and application thereof | 湖北固润科技股份有限公司 | 2023-12-01 | — | — | CN | disclosed |
| US-4175964-A | SUCCESSIVE SURFACE TREATMENT WITH AQUEOUS SOLUTIONS OF PHOSPHORIC ACID AND SILICIC ACID OR ITS SALTS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-11-27 | — | — | US | disclosed |
| US-4172729-A | EXTENDED SHELF LIFE; LOWERED STAINING OF BACKGROUHD AREAS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-10-30 | — | — | US | disclosed |
| US-4123275-A | A VINYL ESTER WITH A HYDROXYALKYL ACRYLATE OR METHACRYLATE, ACRYLAMIDES, METHACRYLAMIDES OR A VINYL HETEROCYCLE | FUJI PHOTO FILM CO., LTD. (JP) | 1978-10-31 | — | — | US | disclosed |
| US-4123276-A | COPOLYMER OF ACRYLIC ESTER AND NITRILE, DIAZO COMPOUND, PRINTING PLATE | FUJI PHOTO FILM CO., LTD. (JP) | 1978-10-31 | — | — | US | disclosed |
| US-4058443-A | PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |
| US-4054722-A | PHOTOGRAPHY | FUJI PHOTO FILM CO., LTD. (JA) | 1977-10-18 | — | — | US | disclosed |
| US-4041017-A | Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams | FUJI PHOTO FILM CO., LTD. (JA) | 1977-08-09 | — | — | US | disclosed |
| US-3936429-A | Reactive polymer | FUJI PHOTO FILM CO., LTD. (JA) | 1976-02-03 | — | — | US | disclosed |
| US-3931248-A | Reactive high polymer compound | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-06 | — | — | US | disclosed |