Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 4/20 | 0.86 |
| ▸ | MAPT | P10636 | 4/20 | 0.79 |
| ▸ | RAB9A | P51151 | 3/20 | 0.79 |
| ▸ | MEN1 | O00255 | 2/20 | 0.79 |
| ▸ | LMNA | P02545 | 2/20 | 0.79 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.79 |
| ▸ | NPC1 | O15118 | 2/20 | 0.79 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.79 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.79 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.79 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.79 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.76 |
| ▸ | NSD2 | O96028 | 1/20 | 0.68 |
| ▸ | HPGD | P15428 | 1/20 | 0.67 |
| ▸ | EGFR | P00533 | 1/20 | 0.64 |
| ▸ | CYP26A1 | O43174 | 1/20 | 0.62 |
| ▸ | MIF | P14174 | 1/20 | 0.62 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.58 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.58 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29099913 | 1.00 | CYP1A2 (0.86) | CYP1A2MAPTRAB9AMEN1LMNA | |
| SCHEMBL11966165 | 1.00 | CYP1A2 (0.86) | CYP1A2MAPTRAB9AMEN1LMNA | |
| SCHEMBL2869244 | 1.00 | CYP1A2 (0.86) | CYP1A2MAPTRAB9AMEN1LMNA | |
| SCHEMBL19474922 | 0.93 | CYP1A2 (1.00) | CYP1A2MAPTRAB9AMEN1LMNA | |
| SCHEMBL815092 | 0.93 | CYP1A2 (1.00) | CYP1A2MAPTRAB9AMEN1LMNA | |
| SCHEMBL815091 | 0.93 | CYP1A2 (1.00) | CYP1A2MAPTRAB9AMEN1LMNA | |
| SCHEMBL9633959 | 0.85 | CYP1A2 (0.70) | CYP1A2MAPTRAB9AMEN1LMNA | |
| SCHEMBL17077343 | 0.85 | EGFR (0.90) | CYP1A2MAPTRAB9AMEN1LMNA | |
| SCHEMBL17077344 | 0.85 | EGFR (0.90) | CYP1A2MAPTRAB9AMEN1LMNA | |
| SCHEMBL9632793 | 0.84 | CYP1A2 (0.68) | CYP1A2MAPTRAB9AMEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116716039-B | Photocatalytic radiation refrigeration coating, preparation method and application | 北京助天科技集团有限公司 | 2023-12-26 | — | — | CN | claimed |
| CN-116716039-A | Photocatalytic radiation refrigeration coating, preparation method and application | 北京助天科技集团有限公司 | 2023-09-08 | — | — | CN | claimed |
| CN-112341615-B | Hydrocarbyl-terminated hyperbranched polyester and photopolymer material comprising the same | 北京航空航天大学 | 2021-07-27 | — | — | CN | claimed |
| CN-112341615-A | Hydrocarbyl-terminated hyperbranched polyester and photopolymer material comprising the same | 北京航空航天大学 | 2021-02-09 | — | — | CN | claimed |
| CN-117700744-A | Polysilsesquioxane and photopolymer holographic recording medium containing same | 中国科学院理化技术研究所 | 2024-03-15 | — | — | CN | disclosed |
| CN-116716039-B | Photocatalytic radiation refrigeration coating, preparation method and application | 北京助天科技集团有限公司 | 2023-12-26 | — | — | CN | disclosed |
| CN-116716039-A | Photocatalytic radiation refrigeration coating, preparation method and application | 北京助天科技集团有限公司 | 2023-09-08 | — | — | CN | disclosed |
| CN-114907503-B | Photoinitiation system for aggregation state environment, photoinitiation polymeric material and application | 北京航空航天大学 | 2023-05-16 | — | — | CN | disclosed |
| CN-114907501-A | Macrocyclic molecule promoted photoinitiation system, photopolymer material and preparation method | 北京航空航天大学 | 2022-08-16 | — | — | CN | disclosed |
| CN-114907503-A | Photoinitiation system for aggregation state environment, photoinitiation polymerization material and application | 北京航空航天大学 | 2022-08-16 | — | — | CN | disclosed |
| WO-2022153617-A1 | HOLOGRAM RECORDING MEDIUM, HOLOGRAM OPTICAL ELEMENT, OPTICAL DEVICE, OPTICAL COMPONENT, AND METHOD FOR FORMING HOLOGRAM DIFFRACTION GRATING | ソニーグループ株式会社 | 2022-07-21 | — | — | WO | disclosed |
| WO-2022153616-A1 | HOLOGRAM RECORDING MEDIUM, HOLOGRAM OPTICAL ELEMENT, OPTICAL DEVICE, OPTICAL COMPONENT, AND METHOD FOR FORMING HOLOGRAM DIFFRACTION GRATING | ソニーグループ株式会社 | 2022-07-21 | — | — | WO | disclosed |
| US-6017681-A | EDGE JOINING OPTICAL PARTS BY APPLYING PHOTOSENSITIVE ADHESIVE TO SEPARATE EDGES AND IRRADIATING TO FORM WAVEGUIDES, THEN MATING EDGES AND HEATING TO MELT AND FUSE WAVEGUIDE MATERIAL | FUJITSU LIMITED (JP) | 2000-01-25 | — | — | US | disclosed |
| US-5902715-A | FORMING A MIRROR-FINISHED SURFACE AT A BOUNDARY BETWEEN A AN IRRADIATED AND A NON-IRRADIATED WAVEGUIDE BY OBLIQUELY IRRADIATING THE WAVEGUIDE; REFRACTIVE INDEX MAY BE INCREASED BY HEATING IRRADIATED PORTION, OR WITH A CATALYZER | FUJITSU LIMITED (JP) | 1999-05-11 | — | — | US | disclosed |
| US-5284735-A | Mixture of radical-polymerizable compound having two or more double bonds, photoinitiator, high molecular weight organic compound and di-substituted ethylene compound | OKAMOTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-02-08 | — | — | US | disclosed |
| EP-0364120-B1 | A CYCLOALKENE COMPOUND AND A RECORDING MATERIAL USING THE COMPOUND | HODOGAYA CHEMICAL COMPANY, LIMITED (JP) | 1993-08-11 | — | — | EP | disclosed |
| US-4987262-A | Absorbers of near infrared radiation, chromogens | HODOGAYA CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| US-4987056-A | IMPROVED SENSITIVITY TO VISIBLE LIGHT | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1991-01-22 | — | — | US | disclosed |
| EP-0364120-A2 | A cycloalkene compound and a recording material using the compound | HODOGAYA CHEMICAL COMPANY, LIMITED (JP) | 1990-04-18 | — | — | EP | disclosed |
| US-4264710-A | AN ETHYLENICALLY UNSATURATED COMPOUND, AND A PHOTOPOLYMERIZATION INIATOR | FUJI PHOTO FILM CO., LTD. (JP) | 1981-04-28 | — | — | US | disclosed |