SCHEMBL815091

SCHEMBL815091

CN(C)c1ccc(/C=C2/CCC/C(=C\c3ccc(N(C)C)cc3)C2=O)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 5/20 1.00
MAPT P10636 5/20 0.88
MEN1 O00255 2/20 0.88
LMNA P02545 2/20 0.88
KMT2A Q03164 2/20 0.88
ALDH1A1 P00352 1/20 0.88
EGFR P00533 1/20 0.74
NPC1 O15118 3/20 0.73
RAB9A P51151 3/20 0.73
SMN1; SMN2 Q16637 3/20 0.73
HPGD P15428 2/20 0.73
MAPK1 P28482 2/20 0.69
MCOLN3 Q8TDD5 1/20 0.69
L3MBTL1 Q9Y468 1/20 0.69
NSD2 O96028 1/20 0.64
HSD11B1 P28845 2/20 0.61
F3 P13726 2/20 0.61
CYP2C9 P11712 1/20 0.61
F10 P00742 1/20 0.56
HTT P42858 2/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL815092 1.00 CYP1A2 (1.00) CYP1A2MAPTMEN1LMNAKMT2A
SCHEMBL19474922 1.00 CYP1A2 (1.00) CYP1A2MAPTMEN1LMNAKMT2A
SCHEMBL2868624 0.93 CYP1A2 (0.86) CYP1A2MAPTMEN1LMNAKMT2A
SCHEMBL2869244 0.93 CYP1A2 (0.86) CYP1A2MAPTMEN1LMNAKMT2A
SCHEMBL29099913 0.93 CYP1A2 (0.86) CYP1A2MAPTMEN1LMNAKMT2A
SCHEMBL11966165 0.93 CYP1A2 (0.86) CYP1A2MAPTMEN1LMNAKMT2A
SCHEMBL3738691 0.88 MAPT (0.93) CYP1A2MAPTMEN1LMNAKMT2A
SCHEMBL10021997 0.88 MAPT (0.93) CYP1A2MAPTMEN1LMNAKMT2A
SCHEMBL10621315 0.88 MAPT (0.93) CYP1A2MAPTMEN1LMNAKMT2A
SCHEMBL17077421 0.86 EGFR (1.00) CYP1A2MAPTMEN1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 134 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050179355-A1 Composition for forming an electron emission source for use in an electron emission device and an electron emission source prepared therefrom SAMSUNG SDI CO., LTD. (KR) 2005-08-18 US claimed
EP-0068808-B1 PHOTORESIST COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1985-06-05 EP claimed
EP-0068808-A2 Photoresist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-01-05 EP claimed
EP-4361224-B1 METHOD FOR PRODUCING A PRINTED MATTER TORAY INDUSTRIES (JP) 2025-12-10 EP disclosed
EP-3351602-B1 LITHOGRAPHIC PRINTING INK, VARNISH FOR LITHOGRAPHIC INKS, AND METHOD FOR PRODUCING PRINTED MATTER USING SAID INK TORAY INDUSTRIES (JP) 2024-06-26 EP disclosed
EP-4361224-A2 METHOD FOR PRODUCING A PRINTED MATTER Toray Industries, Inc. (JP) 2024-05-01 EP disclosed
EP-3594006-B1 METHOD FOR PRODUCING A PRINTED MATTER TORAY INDUSTRIES (JP) 2024-04-24 EP disclosed
EP-3382751-B1 FERROELECTRIC MEMORY ELEMENT, METHOD FOR PRODUCING SAME, MEMORY CELL USING FERROELECTRIC MEMORY ELEMENT, AND RADIO COMMUNICATION DEVICE USING FERROELECTRIC MEMORY ELEMENT TORAY INDUSTRIES (JP) 2023-09-13 EP disclosed
EP-3514822-B1 METHOD FOR MANUFACTURING FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING WIRELESS COMMUNICATION DEVICE TORAY INDUSTRIES (JP) 2023-04-26 EP disclosed
EP-3466704-B1 METHOD FOR PRODUCING PRINTED MATTER TORAY INDUSTRIES (JP) 2023-03-15 EP disclosed
US-20220281217-A1 METHOD FOR MANUFACTURING PRINTED MATTER TORAY INDUSTRIES, INC. (JP) 2022-09-08 US disclosed
EP-0884754-A1 METHOD AND DEVICE FOR MANUFACTURING PLASMA DISPLAY TORAY INDUSTRIES, INC. (JP) 1998-12-16 EP disclosed
EP-0855731-A1 PLASMA DISPLAY AND METHOD OF MANUFACTURING THE SAME TORAY INDUSTRIES, INC. (JP) 1998-07-29 EP disclosed
EP-0845445-A1 PHOTOSENSITIVE CERAMIC GREEN SHEET, CERAMIC PACKAGE, AND PROCESS FOR PRODUCING THE SAME TORAY INDUSTRIES, INC. (JP) 1998-06-03 EP disclosed
EP-0775940-A1 PHOTOSENSITIVE PASTE, PLASMA DISPLAY, AND PROCESS FOR THE PRODUCTION THEREOF TORAY INDUSTRIES, INC. (JP) 1997-05-28 EP disclosed
US-5578697-A DIELECTRIC POLYMERS FOR ELECTRONICS KABUSHIKI KAISHA TOSHIBA (JP) 1996-11-26 US disclosed
EP-0602252-A1 CERAMIC GREEN SHEET TORAY INDUSTRIES, INC. (JP) 1994-06-22 EP disclosed
US-4987056-A IMPROVED SENSITIVITY TO VISIBLE LIGHT TOYO BOSEKI KABUSHIKI KAISHA (JP) 1991-01-22 US disclosed
EP-0068808-B1 PHOTORESIST COMPOSITION JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1985-06-05 EP disclosed
EP-0068808-A2 Photoresist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1983-01-05 EP disclosed