Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 5/20 | 1.00 |
| ▸ | MAPT | P10636 | 5/20 | 0.88 |
| ▸ | MEN1 | O00255 | 2/20 | 0.88 |
| ▸ | LMNA | P02545 | 2/20 | 0.88 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.88 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.88 |
| ▸ | EGFR | P00533 | 1/20 | 0.74 |
| ▸ | NPC1 | O15118 | 3/20 | 0.73 |
| ▸ | RAB9A | P51151 | 3/20 | 0.73 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.73 |
| ▸ | HPGD | P15428 | 2/20 | 0.73 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.69 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.69 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.69 |
| ▸ | NSD2 | O96028 | 1/20 | 0.64 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.61 |
| ▸ | F3 | P13726 | 2/20 | 0.61 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.61 |
| ▸ | F10 | P00742 | 1/20 | 0.56 |
| ▸ | HTT | P42858 | 2/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL815091 | 1.00 | CYP1A2 (1.00) | CYP1A2MAPTMEN1LMNAKMT2A | |
| SCHEMBL19474922 | 1.00 | CYP1A2 (1.00) | CYP1A2MAPTMEN1LMNAKMT2A | |
| SCHEMBL2868624 | 0.93 | CYP1A2 (0.86) | CYP1A2MAPTMEN1LMNAKMT2A | |
| SCHEMBL2869244 | 0.93 | CYP1A2 (0.86) | CYP1A2MAPTMEN1LMNAKMT2A | |
| SCHEMBL29099913 | 0.93 | CYP1A2 (0.86) | CYP1A2MAPTMEN1LMNAKMT2A | |
| SCHEMBL11966165 | 0.93 | CYP1A2 (0.86) | CYP1A2MAPTMEN1LMNAKMT2A | |
| SCHEMBL3738691 | 0.88 | MAPT (0.93) | CYP1A2MAPTMEN1LMNAKMT2A | |
| SCHEMBL10021997 | 0.88 | MAPT (0.93) | CYP1A2MAPTMEN1LMNAKMT2A | |
| SCHEMBL10621315 | 0.88 | MAPT (0.93) | CYP1A2MAPTMEN1LMNAKMT2A | |
| SCHEMBL17077421 | 0.86 | EGFR (1.00) | CYP1A2MAPTMEN1LMNAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070092987-A1 | Conductive electrode powder, a method for preparing the same, a method for preparing an electrode of a plasma display panel by using the same, and a plasma display panel comprising the same | SAMSUNG SDI CO., LTD. (KR) | 2007-04-26 | — | — | US | claimed |
| US-20050179355-A1 | Composition for forming an electron emission source for use in an electron emission device and an electron emission source prepared therefrom | SAMSUNG SDI CO., LTD. (KR) | 2005-08-18 | — | — | US | claimed |
| EP-0068808-B1 | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-06-05 | — | — | EP | claimed |
| US-4407927-A | ANTIHALATION AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-10-04 | — | — | US | claimed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | claimed |
| JP-57211145-A | — | — | None | — | — | JP | disclosed |
| EP-4361224-B1 | METHOD FOR PRODUCING A PRINTED MATTER | TORAY INDUSTRIES (JP) | 2025-12-10 | — | — | EP | disclosed |
| EP-3351602-B1 | LITHOGRAPHIC PRINTING INK, VARNISH FOR LITHOGRAPHIC INKS, AND METHOD FOR PRODUCING PRINTED MATTER USING SAID INK | TORAY INDUSTRIES (JP) | 2024-06-26 | — | — | EP | disclosed |
| CN-113825809-B | Printing ink, method for producing printed matter using same, and printed matter | 东丽株式会社 | 2024-05-31 | — | — | CN | disclosed |
| EP-4361224-A2 | METHOD FOR PRODUCING A PRINTED MATTER | Toray Industries, Inc. (JP) | 2024-05-01 | — | — | EP | disclosed |
| EP-3594006-B1 | METHOD FOR PRODUCING A PRINTED MATTER | TORAY INDUSTRIES (JP) | 2024-04-24 | — | — | EP | disclosed |
| EP-3594293-B1 | ACTINIC-RAY-CURABLE INK FOR LITHOGRAPHIC PRINTING AND METHOD FOR PRODUCING PRINTED MATTER USING SAME | TORAY INDUSTRIES (JP) | 2024-02-21 | — | — | EP | disclosed |
| US-4987262-A | Absorbers of near infrared radiation, chromogens | HODOGAYA CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| US-4987056-A | IMPROVED SENSITIVITY TO VISIBLE LIGHT | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1991-01-22 | — | — | US | disclosed |
| EP-0364120-A2 | A cycloalkene compound and a recording material using the compound | HODOGAYA CHEMICAL COMPANY, LIMITED (JP) | 1990-04-18 | — | — | EP | disclosed |
| EP-0068808-B1 | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1985-06-05 | — | — | EP | disclosed |
| US-4407927-A | ANTIHALATION AGENT | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-10-04 | — | — | US | disclosed |
| EP-0068808-A2 | Photoresist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-01-05 | — | — | EP | disclosed |
| JP-S57211145-A | PHOTORESIST COMPOSITION | JAPAN SYNTHETIC RUBBER CO LTD | 1982-12-24 | — | — | JP | disclosed |
| US-4264710-A | AN ETHYLENICALLY UNSATURATED COMPOUND, AND A PHOTOPOLYMERIZATION INIATOR | FUJI PHOTO FILM CO., LTD. (JP) | 1981-04-28 | — | — | US | disclosed |