Acrylic Acid

Acrylic Acid

SCHEMBL28686996

C=CC(=O)O.[Re]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid SCHEMBL10482239 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL8460539 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL11652408 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL11252224 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL8580358 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL119206 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL8085498 0.95
Acrylic Acid SCHEMBL7706117 0.95 LMNA (1.00)
Acrylic Acid SCHEMBL4371336 0.95
Acrylic Acid SCHEMBL5065665 0.95 LMNA (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113307991-A FEP master batch with high thermal oxidation stability and processing method thereof 日氟荣高分子材料(上海)有限公司 2021-08-27 CN claimed
CN-113307991-A FEP master batch with high thermal oxidation stability and processing method thereof 日氟荣高分子材料(上海)有限公司 2021-08-27 CN disclosed