Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.72 |
| ▸ | TSHR | P16473 | 3/20 | 0.72 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.72 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | ANPEP | P15144 | 1/20 | 0.44 |
| ▸ | ERAP2 | Q6P179 | 1/20 | 0.44 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | ADH1B | P00325 | 1/20 | 0.40 |
| ▸ | ADH1C | P00326 | 1/20 | 0.40 |
| ▸ | ADH1A | P07327 | 1/20 | 0.40 |
| ▸ | ADH4 | P08319 | 1/20 | 0.40 |
| ▸ | ADH7 | P40394 | 1/20 | 0.40 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.39 |
| ▸ | S1PR2 | O95136 | 5/20 | 0.37 |
| ▸ | S1PR4 | O95977 | 5/20 | 0.37 |
| ▸ | S1PR1 | P21453 | 5/20 | 0.37 |
| ▸ | S1PR3 | Q99500 | 5/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26034630 | 1.00 | ALDH1A1 (0.72) | ALDH1A1TSHRCYP3A4KDM4ETDP1 | |
| SCHEMBL9174256 | 1.00 | ALDH1A1 (0.72) | ALDH1A1TSHRCYP3A4KDM4ETDP1 | |
| SCHEMBL9204886 | 1.00 | ALDH1A1 (0.72) | ALDH1A1TSHRCYP3A4KDM4ETDP1 | |
| SCHEMBL2949453 | 1.00 | ALDH1A1 (0.72) | ALDH1A1TSHRCYP3A4KDM4ETDP1 | |
| SCHEMBL11663392 | 1.00 | ALDH1A1 (0.72) | ALDH1A1TSHRCYP3A4KDM4ETDP1 | |
| SCHEMBL7785935 | 0.98 | ALDH1A1 (0.75) | ALDH1A1TSHRCYP3A4KDM4ETDP1 | |
| SCHEMBL11663393 | 0.96 | ALDH1A1 (0.65) | ALDH1A1TSHRCYP3A4KDM4ETDP1 | |
| SCHEMBL20627942 | 0.96 | ALDH1A1 (0.65) | ALDH1A1TSHRCYP3A4KDM4ETDP1 | |
| SCHEMBL11660748 | 0.96 | ALDH1A1 (0.65) | ALDH1A1TSHRCYP3A4KDM4ETDP1 | |
| SCHEMBL23643890 | 0.94 | ALDH1A1 (0.68) | ALDH1A1TSHRCYP3A4KDM4ETDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117608164-A | ESCAP type photoresist and use method thereof | 徐州博康信息化学品有限公司 | 2024-02-27 | — | — | CN | claimed |
| CN-116500859-B | Chemical amplification type I-line photoresist and preparation and use methods thereof | 徐州博康信息化学品有限公司 | 2024-02-09 | — | — | CN | claimed |
| CN-116500859-A | Chemical amplification type I-line photoresist and preparation and use methods thereof | 徐州博康信息化学品有限公司 | 2023-07-28 | — | — | CN | claimed |
| CN-116125748-A | High aspect ratio photoresist and use method thereof | 徐州博康信息化学品有限公司 | 2023-05-16 | — | — | CN | claimed |
| CN-116107166-A | Negative photoresist with high dissolution rate and application method thereof | 徐州博康信息化学品有限公司 | 2023-05-12 | — | — | CN | claimed |
| CN-116009353-A | Positive photoresist and use method thereof | 徐州博康信息化学品有限公司 | 2023-04-25 | — | — | CN | claimed |
| CN-116009354-A | Photoresist composition and preparation and use methods thereof | 徐州博康信息化学品有限公司 | 2023-04-25 | — | — | CN | claimed |
| CN-115903387-A | Positive photoresist composition and using method thereof | 徐州博康信息化学品有限公司 | 2023-04-04 | — | — | CN | claimed |
| CN-115877659-A | Chemically amplified positive photoresist and application method thereof | 徐州博康信息化学品有限公司 | 2023-03-31 | — | — | CN | claimed |
| CN-115857274-A | Chemically amplified photoresist and preparation and use method thereof | 徐州博康信息化学品有限公司 | 2023-03-28 | — | — | CN | claimed |
| CN-115542665-A | Positive chemical amplification type photoresist and using method thereof | 徐州博康信息化学品有限公司 | 2022-12-30 | — | — | CN | claimed |
| CN-115494697-A | Chemically amplified photoresist and preparation and use method thereof | 徐州博康信息化学品有限公司 | 2022-12-20 | — | — | CN | claimed |
| CN-115421354-A | Positive photoresist composition and preparation and use method thereof | 徐州博康信息化学品有限公司 | 2022-12-02 | — | — | CN | claimed |
| CN-114114834-A | Chemically amplified photoresist and preparation and use method thereof | 江苏汉拓光学材料有限公司 | 2022-03-01 | — | — | CN | claimed |
| CN-113943391-A | Polymer resin and synthesis method thereof, photoresist containing polymer resin, preparation method of photoresist and use method of photoresist | 江苏汉拓光学材料有限公司 | 2022-01-18 | — | — | CN | claimed |
| CN-117608164-A | ESCAP type photoresist and use method thereof | 徐州博康信息化学品有限公司 | 2024-02-27 | — | — | CN | disclosed |
| CN-116500859-B | Chemical amplification type I-line photoresist and preparation and use methods thereof | 徐州博康信息化学品有限公司 | 2024-02-09 | — | — | CN | disclosed |
| CN-115421354-A | Positive photoresist composition and preparation and use method thereof | 徐州博康信息化学品有限公司 | 2022-12-02 | — | — | CN | disclosed |
| CN-114114834-A | Chemically amplified photoresist and preparation and use method thereof | 江苏汉拓光学材料有限公司 | 2022-03-01 | — | — | CN | disclosed |
| CN-113943391-A | Polymer resin and synthesis method thereof, photoresist containing polymer resin, preparation method of photoresist and use method of photoresist | 江苏汉拓光学材料有限公司 | 2022-01-18 | — | — | CN | disclosed |